Growth mechanism of GaAs on (110) GaAs studied by high-energy electron diffraction and atomic force microscopy

Author(s):  
M. Wassermeier
2011 ◽  
Vol 1295 ◽  
Author(s):  
Costel Constantin ◽  
Abhijit Chinchore ◽  
Arthur R. Smith

ABSTRACTThe combination of the molecular beam epitaxy growth method with the in-situ reflection high energy electron diffraction measurements currently offers unprecedented control of crystalline growth materials. We present here a stoichiometric study of MnxSc(1-x) [x = 0, 0.03, 0.05, 0.15, 0.25, 0.35, and 0.50] thin films grown on MgO(001) substrates with this growth method. Reflection high energy electron diffraction and atomic force microscopy measurements reveal alloy behavior for all of our samples. In addition, we found that samples Mn0.10Sc0.90 and Mn0.50Sc0.50 display surface self-assembled nanowires with a length/width ratio of ~ 800 – 2000.


1997 ◽  
Vol 70 (8) ◽  
pp. 990-992 ◽  
Author(s):  
Q. Z. Liu ◽  
L. Shen ◽  
K. V. Smith ◽  
C. W. Tu ◽  
E. T. Yu ◽  
...  

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