A single precursor photolitic chemical vapor deposition of silica film using a dielectric barier discharge xenon excimer lamp

1996 ◽  
Vol 69 (10) ◽  
pp. 1399-1401 ◽  
Author(s):  
Atsushi Yokotani ◽  
Noritaka Takezoe ◽  
Kou Kurosawa ◽  
Tatsushi Igarashi ◽  
Hiromitu Matsuno
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Film ◽  
Excimer Lamp ◽  
Single Precursor

SiO2 Film Coatings with VUV Excimer Lamp CVD

1998 ◽  
Vol 555 ◽  
Author(s):  
K. Kurosawa ◽  
N. Takezoe ◽  
H. Yanagida ◽  
R. Nomura ◽  
A. Yokotani
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Film ◽  
Sio2 Film ◽  
Single Crystal Substrate ◽  
Excimer Lamp ◽  
Film Coatings ◽  
Crystal Substrate ◽  
Optical Applications

AbstractSilica film coatings were demonstrated using photo-chemical vapor deposition with a 172-nm Xe excimer lamp. Tetraethoxyorthosilicate (TEOS) molecules were successfully dissociated into SiO2+2C2H5-OH+;(residual C and H) with the 7.2-eV photons. The films were deposited onto a quartz or Al203 single crystal substrate with the deposition rate of 1 nm/min. The films were uniform and smooth enough for optical applications.

Chemical Vapor Deposition of HfO2Thin Films Using the Novel Single Precursor Hafnium 3-Methyl-3-pentoxide, Hf(mp)4

2005 ◽  
Vol 17 (26) ◽  
pp. 6713-6718 ◽  
Author(s):  
Taek S. Yang ◽  
Ki-Seok An ◽  
Eun-Joo Lee ◽  
Wontae Cho ◽  
Hong S. Jang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
The Novel ◽  
Single Precursor
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