Some characteristics of moderate energy metal ion beam focusing by a high current plasma lens

1998 ◽  
Vol 69 (2) ◽  
pp. 1135-1137 ◽  
Author(s):  
A. Goncharov ◽  
A. Dobrovolsky ◽  
I. Protsenko ◽  
V. Kaluh ◽  
I. Onishenko ◽  
...  
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
High Current ◽  
Beam Focusing ◽  
Moderate Energy

Moderate energy metal ion beam focusing by a high-current plasma lens

1999 ◽  
Vol 27 (4) ◽  
pp. 1068-1072 ◽  
Author(s):  
A.A. Goncharov ◽  
S.M. Gubarev ◽  
A.N. Dobrovoiskii ◽  
I.M. Protsenko ◽  
I.V. Litovko ◽  
...  
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
High Current ◽  
Beam Focusing ◽  
Moderate Energy

Extraction of high current Cr ion beam from a multicusp metal ion source

1994 ◽  
Vol 65 (4) ◽  
pp. 1269-1271
Author(s):  
Takatoshi Yamashita ◽  
Yutaka Inouchi ◽  
Shuichi Fujiwara ◽  
Yasuhiro Matsuda ◽  
Hiroshi Inami ◽  
...  
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
Ion Source ◽  
High Current

scholarly journals Ion Beam Modification of the Y-Ba-Cu-O System with the Mevva High Current Metal Ion Source

1989 ◽  
Vol 147 ◽  
Author(s):  
I. G. Brown ◽  
M. D. Rubin ◽  
K. M. Yu ◽  
R. Mutikainen ◽  
N. W. Cheung
Keyword(s):  
Ion Implantation ◽  
Metal Ion ◽  
Rutherford Backscattering Spectrometry ◽  
Ion Beam ◽  
Rf Sputtering ◽  
Ion Source ◽  
Vacuum Arc ◽  
High Dose ◽  
High Current ◽  
Ion Beam Modification

AbstractWe have used high-dose metal ion implantation to ‘fine tune’ the composition of Y-Ba- Cu-O thin films. The films were prepared by either of two rf sputtering systems. One system uses three modified Varian S-guns capable of sputtering various metal powder targets; the other uses reactive rf magnetron sputtering from a single mixed-oxide stoichiometric solid target. Film thickness was typically in the range 2000–5000 A. Substrates of magnesium oxide, zirconia-buffered silicon, and strontium titanate have been used. Ion implantation was carried out using a metal vapor vacuum arc (MEVVA) high current metal ion source. Beam energy was 100–200 keV, average beam current about 1 mA, and dose up to about 1017 ions/cm2. Samples were annealed at 800 – 900°C in wet oxygen. Film composition was determined using Rutherford Backscattering Spectrometry (RBS), and the resistivity versus temperature curves were obtained using a four-point probe method. We find that the zero-resistance temperature can be greatly increased after implantation and reannealing, and that the ion beam modification technique described here provides a powerful means for optimizing the thin film superconducting properties.

On 2D electron cloud dynamics in high-current plasma lens for ion beam focusing

1997 ◽  
Author(s):  
A. A. Goncharov ◽  
I. V. Litovko ◽  
I. N. Onishchenko ◽  
V. F. Zadorozhny
Keyword(s):  
Ion Beam ◽  
Electron Cloud ◽  
High Current ◽  
Beam Focusing ◽  
Cloud Dynamics

High current metal ion beam transport in the UNILAC injector at GSI

1989 ◽  
Vol 278 (3) ◽  
pp. 643-650 ◽  
Author(s):  
P. Spädtke ◽  
H. Emig ◽  
J. Klabunde ◽  
D.M. Rück ◽  
B.H. Wolf ◽  
...  
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
High Current ◽  
Beam Transport

High‐current metal ion beam extraction from a multicusp ion source

1990 ◽  
Vol 61 (1) ◽  
pp. 538-540 ◽  
Author(s):  
Yutaka Inouchi ◽  
Hideki Tanaka ◽  
Hiroshi Inami ◽  
Fumio Fukumaru ◽  
Kouzi Matsunaga
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Extraction ◽  
High Current ◽  
Multicusp Ion Source

Development of high current metal ion beam source

1989 ◽  
Vol 37-38 ◽  
pp. 198-200 ◽  
Author(s):  
Hiroshi Inami ◽  
Fumio Fukumaru ◽  
Yutaka Inouchi ◽  
Daisuke Sato ◽  
Kazuhiko Tanaka ◽  
...  
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
High Current ◽  
Beam Source

scholarly journals Study of functional elements of control systems

2021 ◽  
Vol 2021 (2) ◽  
pp. 126-138
Author(s):  
P.I. Zabolotnyi ◽  
◽  
N.B. Gorev ◽  
O.D. Gryshkevych ◽  
V.M. Mamchuk ◽  
...  
Keyword(s):  
Reflection Coefficient ◽  
Control Systems ◽  
Metal Ion ◽  
Ion Beam ◽  
Pulse Discharge ◽  
Semiconductor Detectors ◽  
National Academy Of Sciences ◽  
Plasma Parameters ◽  
Functional Elements ◽  
Beam Focusing

This paper presents the results of investigations conducted at the Department for Functional Elements of Control Systems of the Institute of Technical Mechanics of the National Academy of Sciences of Ukraine and the State Space Agency of Ukraine over the past five years. The investigations into microwave probe measurements resulted in a two-probe implementation of microwave interferometry for displacement measurement. The possibility of using as few as two probes was demonstrated by analyzing the roots of the equation that relates the magnitude of the unknown complex reflection coefficient to the currents of the semiconductor detectors connected to the probes. To improve the measurement accuracy, methods were developed to do this by accounting for the reflection coefficient of the horn antenna, by changing the operating wavelength according to the measured reflection coefficient, and by compensating the interprobe distance error. The results of development and study of microwave meters of ionospheric plasma parameters are presented. Experimental and computer models of microwave meters of plasma parameters were developed and studied. An experimental and theoretical basis was prepared for the development of meters based on biconical cavities to assess the electron density in a rarefied low-temperature plasma. A novel circuit for a pulse discharge source was designed. The performance characteristics of a magnetron system were studied in the regime of generation of a directed gas and metal ion flow. To provide ion beam focusing, a self-contained anode-layer ion sorce was upgraded. The paper presents the results of development and study of prototype ion-plasma, ion-beam, and combined process devices for auxiliary and main surface strengthening operations and combined strengthening treatment in a single vacuum cycle.

High Current Metal Ion Beam Transport through a 90° Sector Magnet

1994 ◽  
pp. 151-153
Author(s):  
H. Inami ◽  
S. Fujiwara ◽  
T. Yamashita ◽  
Y. Matsuda ◽  
Y. Inouchi ◽  
...  
Keyword(s):  
Metal Ion ◽  
Ion Beam ◽  
High Current ◽  
Beam Transport
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