On 2D electron cloud dynamics in high-current plasma lens for ion beam focusing

1997 ◽  
Author(s):  
A. A. Goncharov ◽  
I. V. Litovko ◽  
I. N. Onishchenko ◽  
V. F. Zadorozhny
1999 ◽  
Vol 27 (4) ◽  
pp. 1068-1072 ◽  
Author(s):  
A.A. Goncharov ◽  
S.M. Gubarev ◽  
A.N. Dobrovoiskii ◽  
I.M. Protsenko ◽  
I.V. Litovko ◽  
...  

1998 ◽  
Vol 69 (2) ◽  
pp. 1135-1137 ◽  
Author(s):  
A. Goncharov ◽  
A. Dobrovolsky ◽  
I. Protsenko ◽  
V. Kaluh ◽  
I. Onishenko ◽  
...  

2008 ◽  
Vol 79 (2) ◽  
pp. 02B715
Author(s):  
Yong-Sub Cho ◽  
Han-Sung Kim ◽  
Hyeok-Jung Kwon

2002 ◽  
Vol 20 (3) ◽  
pp. 435-440 ◽  
Author(s):  
P.A. SEIDL ◽  
D. BACA ◽  
F.M. BIENIOSEK ◽  
A. FALTENS ◽  
S.M. LUND ◽  
...  

The High Current Experiment (HCX) is being assembled at Lawrence Berkeley National Laboratory as part of the U.S. program to explore heavy ion beam transport at a scale representative of the low-energy end of an induction linac driver for fusion energy production. The primary mission of this experiment is to investigate aperture fill factors acceptable for the transport of space-charge dominated heavy ion beams at high space-charge intensity (line-charge density ∼ 0.2 μC/m) over long pulse durations (>4 μs). This machine will test transport issues at a driver-relevant scale resulting from nonlinear space-charge effects and collective modes, beam centroid alignment and beam steering, matching, image charges, halo, lost-particle induced electron effects, and longitudinal bunch control. We present the first experimental results carried out with the coasting K+ ion beam transported through the first 10 electrostatic transport quadrupoles and associated diagnostics. Later phases of the experiment will include more electrostatic lattice periods to allow more sensitive tests of emittance growth, and also magnetic quadrupoles to explore similar issues in magnetic channels with a full driver scale beam.


2018 ◽  
Vol 52 (5) ◽  
pp. 055205 ◽  
Author(s):  
Sanjeev Kumar Maurya ◽  
Sushanta Barman ◽  
Samit Paul ◽  
Sudeep Bhattacharjee

2018 ◽  
Vol 36 (4) ◽  
pp. 470-476 ◽  
Author(s):  
X.P. Zhu ◽  
Q. Zhang ◽  
L. Ding ◽  
C.C. Zhang ◽  
Yu. Isakova ◽  
...  

AbstractThe paper presents the results of a study on propagation and focusing of high-intensity pulsed ion beams, produced by a self-magnetically insulated diode of semi-cylindrical geometry at the TEMP-6 accelerator (120 ns, 200–250 kV). We examined the space-charge neutralization of the beam, the energy density in the focus, the divergence of the beam, and its shot-to-shot displacement in the focal plane. It is found that the concentration of low-energy electrons in the beam is 1.3–1.5 times higher than the concentration of ions. We observed additional ion focusing by its own space charge. With an increase in the density of the net negative (electrons and ions) charge of the beam from 3.6 to 9 µC/cm2, the total divergence (the sum of the beam divergence in the vertical and horizontal planes) decreases from 11.4 to 4.5°. It leads to an increase in the energy density in the focus from 4 up to 10–12 J/cm2. To increase the electrons concentration in the beam, a metal grid installed in the ion beam transport region was used.


1993 ◽  
Vol 316 ◽  
Author(s):  
E.N. Shauly ◽  
E. Koltin ◽  
I. Munin ◽  
Y. Avrahamov

ABSTRACTIon implantation in semiconductor devices frequently leads to a substantial wafer surface charge build up. Control of this charge during high current implantation is a major process issue, as it may affect the yield and reliability of thin dielectric layers. In addition, the charge build up may affect the ion beam resulting in a non-uniform implant and a reduction in device yield. Control of a specific machine parameter, that will give the charge condition of the ion implanter will enable to neutralize the charge build up.In this study, Disk Current Monitoring (DCM) is shown to be a reliable method for monitoring the Electron Shower (ES) performance in real time. A correlation was found between DCM level and yields, and between DCM level and breakdown voltage, as well as different maintenance activities regarding me ES. A simple 5 steps method is described to achieve a reliable, real time charge monitor, to insure operation within the “High Yield Range”.


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