Two‐dimensional electron gas in GaN–AlGaN heterostructures deposited using trimethylamine‐alane as the aluminum source in low pressure metalorganic chemical vapor deposition
1999 ◽
Vol 203
(3)
◽
pp. 443-446
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1994 ◽
Vol 145
(1-4)
◽
pp. 953-957
◽
1993 ◽
Vol 32
(Part 2, No. 5A)
◽
pp. L648-L649
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