A time‐of‐flight mass filter for ion and cluster ion photodissociation studies

1990 ◽  
Vol 61 (4) ◽  
pp. 1204-1210 ◽  
Author(s):  
J. A. Syage ◽  
J. Steadman
1996 ◽  
Vol 03 (01) ◽  
pp. 1017-1021 ◽  
Author(s):  
J. MATSUO ◽  
M. AKIZUKI ◽  
J. NORTHBY ◽  
G.H. TAKAOKA ◽  
I. YAMADA

A high-current (~100 nA) cluster-ion-beam equipment with a new mass filter has been developed to study the energetic cluster-bombardment effects on solid surfaces. A dramatic reduction of Cu concentration on silicon surfaces has been achieved by 20-keV Ar cluster (N~3000) ion bombardment. The removal rate of Cu with cluster ions is two orders of magnitude higher than that with monomer ions. A significantly higher sputtering yield is expected for cluster-ion irradiation. An energetic cluster-ion beam is quite suitable for removal of metal.


1979 ◽  
Vol 50 (10) ◽  
pp. 1278-1284 ◽  
Author(s):  
M. D. Burrows ◽  
S. R. Ryan ◽  
W. E. Lamb ◽  
L. C. McIntyre

2006 ◽  
Vol 77 (3) ◽  
pp. 03B509 ◽  
Author(s):  
Gikan H. Takaoka ◽  
Hidetaka Noguchi ◽  
Kazuya Nakayama ◽  
Masakazu Kawashita

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