Operation of a normal‐incidence transmission grating monochromator at ALLADIN (invited)

1989 ◽  
Vol 60 (7) ◽  
pp. 1579-1587 ◽  
Author(s):  
Roman Tatchyn ◽  
Elisabeth Källne ◽  
Arthur Toor ◽  
Theodore Cremer ◽  
Paul Csonka
Keyword(s):  
Normal Incidence ◽  
Transmission Grating ◽  
Grating Monochromator

Applications of VUV extra-focus mechanism: high-performance dual-mode monochromator from VUV to soft X-ray

2015 ◽  
Vol 22 (6) ◽  
pp. 1353-1358 ◽  
Author(s):  
Chaofan Xue ◽  
Yanqing Wu ◽  
Ying Zou ◽  
Lian Xue ◽  
Zhi Guo ◽  
...  
Keyword(s):  
High Performance ◽  
Vacuum Ultraviolet ◽  
Normal Incidence ◽  
Resolving Power ◽  
Dual Mode ◽  
Included Angle ◽  
X Ray ◽  
Line Spacing ◽  
Grating Monochromator ◽  
Mode Solution

A new monochromator scheme is presented in which an extra-focus constant-included-angle varied-line-spacing cylindrical-grating monochromator (extra-focus CIA-VCGM) is conveniently combined with a variable-included-angle varied-line-spacing plane-grating monochromator (VIA-VPGM). This dual-mode solution delivers high performance in the energy range from vacuum ultraviolet (VUV) to soft X-ray. The resolving power and the efficiency of this dual-mode grating monochromator are analyzed in detail based on realistic parameters. Comparisons with the commonly used variable-included-angle plane-grating monochromator and normal-incidence monochromator (VIA-PGM/NIM) hybrid monochromator are made.

scholarly journals Diffraction mechanism of five-port transmission gratings

2020 ◽  
Vol 50 (4) ◽  
Author(s):  
Chenhao Gao ◽  
Bo Wang ◽  
Kunhua Wen ◽  
Ziming Meng ◽  
Qu Wang ◽  
...  
Keyword(s):  
Beam Splitter ◽  
Diffraction Order ◽  
Normal Incidence ◽  
Propagation Mechanism ◽  
Beam Splitting ◽  
Transmission Grating ◽  
Process Tolerance ◽  
Wide Range ◽  
Rigorous Coupled Wave ◽  
Modal Method

This paper designs a five-port transmission grating under normal incidence. Rigorous coupled-wave approach is used to optimize the grating parameters. The energy of the grating is mainly dispersed to the 0th, ±1st and ±2nd orders. The efficiency of each diffraction order under both polarizations is close to 20%. The modal method is used to describe the propagation mechanism of the two polarized lights in the grating, and the diffraction behavior of the grating is analyzed. In addition, the grating has a wide range of incident characteristics and a large process tolerance. Therefore, this five-port beam splitter with a connecting layer will be a good polarization-independent beam splitting device.

Design of a high-flux and high-resolution VUV bending-magnet beamline

1998 ◽  
Vol 5 (3) ◽  
pp. 562-564 ◽  
Author(s):  
T.-F. Hsieh ◽  
L.-R. Huang ◽  
S.-C. Chung ◽  
T.-E. Dann ◽  
P.-C. Tseng ◽  
...  
Keyword(s):  
High Resolution ◽  
Incident Angle ◽  
Normal Incidence ◽  
Resolving Power ◽  
High Flux ◽  
Image Size ◽  
Exit Slit ◽  
Sample Position ◽  
Grating Monochromator ◽  
Under Construction

A high-flux and high-resolution VUV beamline (4–40 eV) has been designed and is under construction at SRRC. This beamline, which collects 50 mrad of horizontal radiation, uses a 6 m cylindrical-grating monochromator with an incident angle of 70° instead of the conventional normal-incidence-monochromator (NIM) design. Special features, such as movable entrance slit, bendable vertical focusing mirror and movable curved exit slit, are employed to enhance greatly the beamline performance. With both slit openings set at 10 µm, the energy-resolving power can reach as high as 70000. Photon fluxes of 1 × 1013 and 1 × 1010 photons s−1 are calculated for energy-resolving powers of 1000 and 40000, respectively. The best image size at the sample position is smaller than 0.45 × 0.2 mm.

The U125 insertion device beamline at the Metrology Light Source

2019 ◽  
Vol 26 (2) ◽  
pp. 535-542 ◽  
Author(s):  
Alexander Gottwald ◽  
Hendrik Kaser ◽  
Michael Kolbe
Keyword(s):  
Light Source ◽  
Photoelectron Spectroscopy ◽  
Near Infrared ◽  
Normal Incidence ◽  
Grazing Incidence ◽  
Uncertainty Budget ◽  
Photon Flux ◽  
Insertion Device ◽  
Grating Monochromator

At the Metrology Light Source, an electron storage ring dedicated to metrological applications, the U125 insertion device beamline utilizes undulator radiation for various applications over a broad spectral range. Using a hybrid normal-incidence and grazing-incidence in-vacuum switchable plane-grating monochromator, a spectral region ranging from the near-infrared to soft X-ray is covered. The beamline is dedicated to surface-analytical methods, e.g. ellipsometry, photoelectron spectroscopy or photoemission tomography. The traceability of radiometric quantities, i.e. quantitative determination of the available radiant power (or photon flux), is required for some of these applications to support the metrological aspect of the measurements. In particular, attention is paid to the suppression of unwanted spectral contributions from higher diffraction orders, and to the monitoring of the radiation intensity during the measurements. With the results from the beamline commissioning, an uncertainty budget for all relevant radiometric quantities was established.

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