A differentially pumped low‐energy ion beam system for an ultrahigh‐vacuum atom‐probe field‐ion microscope

1979 ◽  
Vol 50 (9) ◽  
pp. 1125-1129 ◽  
Author(s):  
Jun Amano ◽  
David N. Seidman
Keyword(s):  
Ion Beam ◽  
Ultrahigh Vacuum ◽  
Atom Probe ◽  
Low Energy ◽  
Probe Field ◽  
Beam System ◽  
Field Ion Microscope

A miniature electron‐beam evaporator for an ultrahigh‐vacuum atom‐probe field‐ion microscope

1990 ◽  
Vol 61 (12) ◽  
pp. 3745-3749 ◽  
Author(s):  
X. W. Lin ◽  
J. G. Hu ◽  
D. N. Seidman ◽  
H. Morikawa
Keyword(s):  
Electron Beam ◽  
Ultrahigh Vacuum ◽  
Atom Probe ◽  
Probe Field ◽  
Field Ion Microscope

Fabrication and characterization - by High Resolution Electron Microscopy and atom probe microanalysis - of Co-based metallic multilayer films

1990 ◽  
Vol 48 (4) ◽  
pp. 772-773
Author(s):  
Amanda K. Petford-Long ◽  
A. Cerezo ◽  
M.G. Hetherington
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Atom Probe ◽  
Multilayer Films ◽  
Interface Roughness ◽  
Probe Field ◽  
Resolution Electron ◽  
Potential Applications ◽  
Field Ion Microscope

The fabrication of multilayer films (MLF) with layer thicknesses down to one monolayer has led to the development of materials with unique properties not found in bulk materials. The properties of interest depend critically on the structure and composition of the films, with the interfacial regions between the layers being of particular importance. There are a number of magnetic MLF systems based on Co, several of which have potential applications as perpendicular magnetic (e.g Co/Cr) or magneto-optic (e.g. Co/Pt) recording media. Of particular concern are the effects of parameters such as crystallographic texture and interface roughness, which are determined by the fabrication conditions, on magnetic properties and structure.In this study we have fabricated Co-based MLF by UHV thermal evaporation in the prechamber of an atom probe field-ion microscope (AP). The multilayers were deposited simultaneously onto cobalt field-ion specimens (for AP and position-sensitive atom probe (POSAP) microanalysis without exposure to atmosphere) and onto the flat (001) surface of oxidised silicon wafers (for subsequent study in cross-section using high-resolution electron microscopy (HREM) in a JEOL 4000EX. Deposi-tion was from W filaments loaded with material in the form of wire (Co, Fe, Ni, Pt and Au) or flakes (Cr). The base pressure in the chamber was around 8×10−8 torr during deposition with a typical deposition rate of 0.05 - 0.2nm/s.

scholarly journals Atomic Level Characterization of the Morphology of Phases in Chromindur Magnetic Alloys

1991 ◽  
Vol 232 ◽  
Author(s):  
M. K Miller ◽  
P. P. Camus ◽  
M. G. Hetherington
Keyword(s):  
Atom Probe ◽  
Heat Treatments ◽  
Miscibility Gap ◽  
Probe Field ◽  
Magnet Alloy ◽  
Two Phases ◽  
Isothermal Heat Treatments ◽  
Field Ion Microscope ◽  
Permanent Magnet Alloy

ABSTRACTThe atom probe field ion microscope has been used to characterize the morphology and determine the compositions of the iron-rich a and chromium-enriched α′ phases produced during isothermal and step cooled heat treatments in a Chromindur II ductile permanent magnet alloy. The good magnetic properties of this material are due to a combination of the composition of the two phases and the isolated nature and size of the ferromagnetic a phase. The morphology of the a phase is produced as a result of the shape of the miscibility gap and the step-cooled heat treatment and is distinctly different from that formed during isothermal heat treatments.

Atom probe field ion microscope studies of palladium silicide on silicon

1995 ◽  
Vol 87-88 ◽  
pp. 279-283
Author(s):  
R.A. King ◽  
R.A.D. Mackenzie ◽  
G.D.W. Smith ◽  
N.A. Cade
Keyword(s):  
Atom Probe ◽  
Probe Field ◽  
Palladium Silicide ◽  
Field Ion Microscope

An ultra-low energy (30–200 eV) ion-atomic beam source for ion-beam-assisted deposition in ultrahigh vacuum

2011 ◽  
Vol 82 (8) ◽  
pp. 083302 ◽  
Author(s):  
Jindřich Mach ◽  
Tomáš Šamořil ◽  
Stanislav Voborný ◽  
Miroslav Kolíbal ◽  
Jakub Zlámal ◽  
...  
Keyword(s):  
Atomic Beam ◽  
Ion Beam ◽  
Ultrahigh Vacuum ◽  
Low Energy ◽  
Beam Source ◽  
Atomic Beam Source ◽  
Ion Beam Assisted Deposition
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