scholarly journals A Differentially-Pumped Low-Energy Ion-Beam System for an Ultra-High Vacuum (UHV) Atom-Probe Field-Ion Microscope

1978 ◽  
Author(s):  
Jun Amano ◽  
David N. Seidman
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Atom Probe ◽  
Low Energy ◽  
Ultra High Vacuum ◽  
Probe Field ◽  
Beam System ◽  
Field Ion Microscope

scholarly journals 8. A specimen-exchange device for an ultra-high vacuum atom-probe field-ion microscope

Vacuum ◽  
1978 ◽  
Vol 28 (12) ◽  
pp. 543-545 ◽  
Author(s):  
Alfred Wagner ◽  
Thomas M. Hall ◽  
David N. Seidman
Keyword(s):  
High Vacuum ◽  
Atom Probe ◽  
Ultra High Vacuum ◽  
Probe Field ◽  
Field Ion Microscope

Carbon Nitride Film Formation by Low Energy Positive and Negative Ion Beam Deposition

1996 ◽  
Vol 438 ◽  
Author(s):  
N. Tsubouchi ◽  
Y. Horino ◽  
B. Enders ◽  
A. Chayahara ◽  
A. Kinomura ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Rutherford Backscattering Spectrometry ◽  
Ion Beam ◽  
High Vacuum ◽  
Negative Ions ◽  
Low Energy ◽  
Ultra High Vacuum ◽  
Negative Ion ◽  
Nitride Film ◽  
Ion Energy

AbstractUsing a newly developed ion beam apparatus, PANDA (Positive And Negative ions Deposition Apparatus), carbon nitride films were prepared by simultaneous deposition of mass-analyzed low energy positive and negative ions such as C2-, N+, under ultra high vacuum conditions, in the order of 10−6 Pa on silicon wafer. The ion energy was varied from 50 to 400 eV. The film properties as a function of their beam energy were evaluated by Rutherford Backscattering Spectrometry (RBS), Fourier Transform Infrared spectroscopy (FTIR) and Raman scattering. From the results, it is suggested that the C-N triple bond contents in films depends on nitrogen ion energy.

Trace element detection at the atomic level by atom probe microanalysis

1980 ◽  
Vol 295 (1413) ◽  
pp. 131-132
Keyword(s):  
Trace Elements ◽  
Detection Efficiency ◽  
High Vacuum ◽  
Time Of Flight ◽  
Atom Probe ◽  
Ultra High Vacuum ◽  
Transition Elements ◽  
Quantitative Accuracy ◽  
Computer Controlled ◽  
Field Ion Microscope

A computer-controlled atom probe time-of-flight mass spectrometer-field ion microscope system has been developed which permits chemical microanalysis of metals and alloys with approximately 1 nm spatial resolution, good quantitative accuracy and excellent sensitivity for the detection of trace elements. The mass resolution is sufficient to separate adjacent isotopes of the transition elements, and the detection efficiency for single atoms is approximately 90 %. Operation is carried out under ultra-high vacuum conditions to minimize background noise levels. Detection of local concentrations of trace elements and impurities of the order of 0.1 at. % is routinely obtained with this instrument. An additional analytical facility, termed an imaging field desorption atom probe, (i.f.d.a.p.) has also recently been constructed. This produces a picture of the spatial distribution of a selected chemical element over the whole of the imaged region of the field-ion specimen; the information obtained is essentially complementary to that from the conventional time-of-flight atom probe.

Fabrication and characterization - by High Resolution Electron Microscopy and atom probe microanalysis - of Co-based metallic multilayer films

1990 ◽  
Vol 48 (4) ◽  
pp. 772-773
Author(s):  
Amanda K. Petford-Long ◽  
A. Cerezo ◽  
M.G. Hetherington
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Atom Probe ◽  
Multilayer Films ◽  
Interface Roughness ◽  
Probe Field ◽  
Resolution Electron ◽  
Potential Applications ◽  
Field Ion Microscope

The fabrication of multilayer films (MLF) with layer thicknesses down to one monolayer has led to the development of materials with unique properties not found in bulk materials. The properties of interest depend critically on the structure and composition of the films, with the interfacial regions between the layers being of particular importance. There are a number of magnetic MLF systems based on Co, several of which have potential applications as perpendicular magnetic (e.g Co/Cr) or magneto-optic (e.g. Co/Pt) recording media. Of particular concern are the effects of parameters such as crystallographic texture and interface roughness, which are determined by the fabrication conditions, on magnetic properties and structure.In this study we have fabricated Co-based MLF by UHV thermal evaporation in the prechamber of an atom probe field-ion microscope (AP). The multilayers were deposited simultaneously onto cobalt field-ion specimens (for AP and position-sensitive atom probe (POSAP) microanalysis without exposure to atmosphere) and onto the flat (001) surface of oxidised silicon wafers (for subsequent study in cross-section using high-resolution electron microscopy (HREM) in a JEOL 4000EX. Deposi-tion was from W filaments loaded with material in the form of wire (Co, Fe, Ni, Pt and Au) or flakes (Cr). The base pressure in the chamber was around 8×10−8 torr during deposition with a typical deposition rate of 0.05 - 0.2nm/s.

Large Area Surface Treatment by Ion Beam Technology

1996 ◽  
Vol 438 ◽  
Author(s):  
R. L. C. Wu ◽  
W. Lanter
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Polycrystalline Diamond ◽  
Carbon Films ◽  
Ultra High Vacuum ◽  
Diamond Like Carbon ◽  
Chemical Compositions ◽  
Rf Power ◽  
Large Area ◽  
Ion Energy

AbstractAn ultra high vacuum ion beam system, consisting of a 20 cm diameter Rf excilted (13.56 MHz) ion gun and a four-axis substrate scanner, has been used to modify large surfaces (up to 1000 cm2) of various materials, including; infrared windows, silicon nitride, polycrystalline diamond, 304 and 316 stainless steels, 440C and M50 steels, aluminum alloys, and polycarbonates; by depositing different chemical compositions of diamond-like carbon films. The influences of ion energy, Rf power, gas composition (H2/CH4 , Ar/CH4 and O2/CH4/H2), on the diamond-like carbon characteristics has been studied. Particular attention was focused on adhesion, environmental effects, IR(3–12 μm) transmission, coefficient of friction, and wear factors under spacelike environments of diamond-like carbon films on various substrates. A quadrupole mass spectrometer was utilized to monitor the ion beam composition for quality control and process optimization.

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