Low temperature epitaxial silicon film growth using high vacuum electron‐cyclotron‐resonance plasma deposition

Scott J. DeBoer; Vikram L. Dalal; George Chumanov; Randy Bartels

doi:10.1063/1.113156

Low temperature epitaxial silicon film growth using high vacuum electron‐cyclotron‐resonance plasma deposition

Applied Physics Letters ◽

10.1063/1.113156 ◽

1995 ◽

Vol 66 (19) ◽

pp. 2528-2530 ◽

Cited By ~ 43

Author(s):

Scott J. DeBoer ◽

Vikram L. Dalal ◽

George Chumanov ◽

Randy Bartels

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Film Growth ◽

Plasma Deposition ◽

Silicon Film ◽

High Vacuum ◽

Epitaxial Silicon ◽

Epitaxial Silicon Film ◽

Resonance Plasma

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Growth of Epitaxial Silicon Film at Low Temperature by Using Sputtering-Type Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.l220 ◽

1999 ◽

Vol 38 (Part 2, No. 3A) ◽

pp. L220-L222 ◽

Cited By ~ 5

Author(s):

Junsi Gao ◽

Hiroshi Nakashima ◽

Naofumi Sakai ◽

Dawei Gao ◽

Junli Wang ◽

...

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Silicon Film ◽

Electron Cyclotron ◽

Epitaxial Silicon ◽

Electron Cyclotron Resonance Plasma ◽

Epitaxial Silicon Film ◽

Resonance Plasma

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Low temperature epitaxial silicon growth using electron cyclotron resonance plasma deposition

10.31274/rtd-180813-12652 ◽

1995 ◽

Author(s):

Scott Jeffrey DeBoer

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Epitaxial Silicon ◽

Electron Cyclotron Resonance Plasma ◽

Silicon Growth ◽

Resonance Plasma

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Electron cyclotron resonance plasma deposition as a promising technique for low-temperature hard coatings

Vacuum ◽

10.1016/0042-207x(94)90012-4 ◽

1994 ◽

Vol 45 (10-11) ◽

pp. 1023-1025 ◽

Cited By ~ 2

Author(s):

MJ Hernandez ◽

FJ Gomez ◽

J Garrido ◽

J Piqueras ◽

C Gomez-Aleixandre

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Hard Coatings ◽

Promising Technique ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580664 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1951-1954 ◽

Cited By ~ 20

Author(s):

H. Nakashima ◽

K. Furukawa ◽

Y. C. Liu ◽

D. W. Gao ◽

Y. Kashiwazaki ◽

...

Keyword(s):

Low Temperature ◽

Silicon Dioxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

High Quality ◽

Electron Cyclotron Resonance Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Resonance Plasma

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Effects of electron cyclotron resonance plasma thermal oxidation on the properties of polycrystalline silicon film

Applied Physics Letters ◽

10.1063/1.114363 ◽

1995 ◽

Vol 67 (13) ◽

pp. 1880-1882 ◽

Cited By ~ 12

Author(s):

Jung‐Yeal Lee ◽

Chul‐Hi Han ◽

Choong‐Ki Kim ◽

Bok‐Ki Kim

Keyword(s):

Thermal Oxidation ◽

Cyclotron Resonance ◽

Polycrystalline Silicon ◽

Electron Cyclotron Resonance ◽

Silicon Film ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Polycrystalline Silicon Film ◽

Resonance Plasma

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Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114962 ◽

1995 ◽

Vol 67 (7) ◽

pp. 971-973 ◽

Cited By ~ 21

Author(s):

J. L. Rogers ◽

P. S. Andry ◽

W. J. Varhue ◽

P. McGaughnea ◽

E. Adams ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Homoepitaxial Growth ◽

Resonance Plasma

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Electron-Cyclotron-Resonance Plasma Deposition of Carbon onto Silicon

Springer Proceedings in Physics - Amorphous and Crystalline Silicon Carbide II ◽

10.1007/978-3-642-75048-9_12 ◽

1989 ◽

pp. 60-65

Author(s):

J. Pankove ◽

V. Hornback ◽

S. Sritharan ◽

J. Wilson ◽

S. Asher ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Deposition of low temperature Si-based insulators by the electron cyclotron resonance plasma method

Thin Solid Films ◽

10.1016/s0040-6090(97)00510-5 ◽

1998 ◽

Vol 317 (1-2) ◽

pp. 116-119 ◽

Cited By ~ 6

Author(s):

S Garcia ◽

J.M Martin ◽

I Martil ◽

M Fernandez ◽

G Gonzalez-Diaz

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Resonance Plasma

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Low-Temperature Si Surface Cleaning by Hydrogen Beam with Electron-Cyclotron-Resonance Plasma Excitation

Japanese Journal of Applied Physics ◽

10.1143/jjap.29.l1181 ◽

1990 ◽

Vol 29 (Part 2, No. 7) ◽

pp. L1181-L1184 ◽

Cited By ~ 21

Author(s):

Tomohiro Shibata ◽

Yasushi Nanishi ◽

Masatomo Fujimoto

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Surface Cleaning ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Excitation ◽

Hydrogen Beam ◽

Resonance Plasma

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SiO2 planarization technology with biasing and electron cyclotron resonance plasma deposition for submicron interconnections

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583518 ◽

1986 ◽

Vol 4 (4) ◽

pp. 818 ◽

Cited By ~ 44

Author(s):

Katsuyuki Machida

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Deposition ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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