Effect of the boron doping concentration and Fermi level on the generation of crystal originated particles inp‐type Czochralski silicon wafers

1994 ◽  
Vol 65 (16) ◽  
pp. 2069-2071 ◽  
Author(s):  
W. Wijaranakula ◽  
S. Archer
Keyword(s):  
Fermi Level ◽  
Doping Concentration ◽  
Boron Doping ◽  
Silicon Wafers ◽  
Czochralski Silicon

scholarly journals Contactless determination of doping concentration and resistivity of silicon wafers with cavity ring-down technique

2020 ◽  
Vol 16 ◽  
pp. 102939
Author(s):  
Qian Wang ◽  
Chunyu Zhang ◽  
Yujun Du ◽  
Rong Liu ◽  
Linqiu Tan ◽  
...  
Keyword(s):  
Doping Concentration ◽  
Silicon Wafers ◽  
Cavity Ring Down

Investigation of stoichiometry of oxygen precipitates in Czochralski silicon wafers by means of EDX, EELS and FTIR spectroscopy

2016 ◽  
Vol 99 ◽  
pp. 231-235 ◽  
Author(s):  
D. Kot ◽  
G. Kissinger ◽  
M.A. Schubert ◽  
M. Klingsporn ◽  
A. Huber ◽  
...  
Keyword(s):  
Ftir Spectroscopy ◽  
Silicon Wafers ◽  
Czochralski Silicon ◽  
Oxygen Precipitates

Dependence of Mechanical Strength of Czochralski Silicon Wafers on the Temperature of Oxygen Precipitation Annealing

1997 ◽  
Vol 144 (3) ◽  
pp. 1111-1120 ◽  
Author(s):  
Koji Sueoka ◽  
Masanori Akatsuka ◽  
Hisashi Katahama ◽  
Naoshi Adachi
Keyword(s):  
Mechanical Strength ◽  
Silicon Wafers ◽  
Czochralski Silicon ◽  
Oxygen Precipitation

Gettering of surface and bulk impurities in Czochralski silicon wafers

1978 ◽  
Vol 32 (11) ◽  
pp. 747-749 ◽  
Author(s):  
G. A. Rozgonyi ◽  
C. W. Pearce
Keyword(s):  
Silicon Wafers ◽  
Czochralski Silicon

scholarly journals Comparison on mechanical properties of heavily phosphorus- and arsenic-doped Czochralski silicon wafers

AIP Advances ◽  
2018 ◽  
Vol 8 (4) ◽  
pp. 045301 ◽  
Author(s):  
Kang Yuan ◽  
Yuxin Sun ◽  
Yunhao Lu ◽  
Xingbo Liang ◽  
Daxi Tian ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Silicon Wafers ◽  
Czochralski Silicon

Improvement of Czochralski Silicon Wafers By High‐Temperature Annealing

1995 ◽  
Vol 142 (9) ◽  
pp. 3189-3192 ◽  
Author(s):  
D. Gräf ◽  
U. Lambert ◽  
M. Brohl ◽  
A. Ehlert ◽  
R. Wahlich ◽  
...  
Keyword(s):  
High Temperature ◽  
Silicon Wafers ◽  
High Temperature Annealing ◽  
Czochralski Silicon
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