Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition

1994 ◽  
Vol 65 (6) ◽  
pp. 696-698 ◽  
Author(s):  
A. Bousetta ◽  
M. Lu ◽  
A. Bensaoula ◽  
A. Schultz
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