Estimating oxide‐trap, interface‐trap, and border‐trap charge densities in metal‐oxide‐semiconductor transistors

1994 ◽  
Vol 64 (15) ◽  
pp. 1965-1967 ◽  
Author(s):  
D. M. Fleetwood ◽  
M. R. Shaneyfelt ◽  
J. R. Schwank
Keyword(s):  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Interface Trap ◽  
Trap Charge ◽  
Charge Densities ◽  
Oxide Trap

scholarly journals Interface trap density and mobility extraction in InGaAs buried quantum well metal-oxide-semiconductor field-effect-transistors by gated Hall method

2014 ◽  
Vol 104 (13) ◽  
pp. 131605 ◽  
Author(s):  
Thenappan Chidambaram ◽  
Dmitry Veksler ◽  
Shailesh Madisetti ◽  
Andrew Greene ◽  
Michael Yakimov ◽  
...  
Keyword(s):  
Quantum Well ◽  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Metal Oxide Semiconductor ◽  
Trap Density ◽  
Oxide Semiconductor ◽  
Interface Trap Density ◽  
Interface Trap ◽  
Hall Method

scholarly journals Effective reduction of fixed charge densities in germanium based metal-oxide-semiconductor devices

2011 ◽  
Vol 99 (5) ◽  
pp. 052906 ◽  
Author(s):  
Shaoren Deng ◽  
Qi Xie ◽  
Davy Deduytsche ◽  
Marc Schaekers ◽  
Dennis Lin ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Semiconductor Devices ◽  
Metal Oxide Semiconductor ◽  
Fixed Charge ◽  
Oxide Semiconductor ◽  
Charge Densities ◽  
Effective Reduction

Interface trap evaluation of Pd/Al2O3/GaN metal oxide semiconductor capacitors and the influence of near-interface hydrogen

2013 ◽  
Vol 103 (20) ◽  
pp. 201607 ◽  
Author(s):  
R. D. Long ◽  
C. M. Jackson ◽  
J. Yang ◽  
A. Hazeghi ◽  
C. Hitzman ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Interface Trap
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