Preparation of cubic boron nitride films by low pressure inductively coupled plasma enhanced chemical vapor deposition

Takanori Ichiki; Toyonobu Yoshida

doi:10.1063/1.111001

Preparation of cubic boron nitride films by low pressure inductively coupled plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.111001 ◽

1994 ◽

Vol 64 (7) ◽

pp. 851-853 ◽

Cited By ~ 54

Author(s):

Takanori Ichiki ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Boron Nitride Films

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Growth of Cubic Boron Nitride Films by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4385 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4385-4388 ◽

Cited By ~ 5

Author(s):

Takanori Ichiki ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Boron Nitride Films

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Effects of the substrate bias on the formation of cubic boron nitride by inductively coupled plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.356411 ◽

1994 ◽

Vol 75 (3) ◽

pp. 1330-1334 ◽

Cited By ~ 79

Author(s):

Takanori Ichiki ◽

Toshihiro Momose ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Substrate Bias ◽

Inductively Coupled

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Threshold sheath potential for the nucleation and growth of cubic boron nitride by inductively coupled plasma enhanced chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.118449 ◽

1997 ◽

Vol 70 (8) ◽

pp. 946-948 ◽

Cited By ~ 14

Author(s):

Satoshi Amagi ◽

Daisuke Takahashi ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Nucleation And Growth ◽

Inductively Coupled

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Mass spectrometric study of low-pressure inductively coupled plasma for chemical vapor deposition of cubic boron nitride films

Science and Technology of Advanced Materials ◽

10.1016/j.stam.2003.10.029 ◽

2003 ◽

Vol 4 (6) ◽

pp. 613-616 ◽

Cited By ~ 27

Author(s):

Hangsheng Yang ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Mass Spectrometric Study ◽

Mass Spectrometric ◽

Spectrometric Study ◽

Inductively Coupled ◽

Boron Nitride Films

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Cubic boron nitride thin film synthesis on silica substrates by low-pressure inductively-coupled r.f. plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00540-4 ◽

1999 ◽

Vol 354 (1-2) ◽

pp. 24-28 ◽

Cited By ~ 6

Author(s):

K.K. Chattopadhyay ◽

S. Matsumoto ◽

Y.-F. Zhang ◽

I. Sakaguchi ◽

M. Nishitani-Gamo ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Film Synthesis

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Detection of C2 radicals in low-pressure inductively coupled plasma source for diamond chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00420-9 ◽

2001 ◽

Vol 10 (3-7) ◽

pp. 388-392 ◽

Cited By ~ 18

Author(s):

T. Shiomi ◽

H. Nagai ◽

K. Kato ◽

M. Hiramatsu ◽

M. Nawata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Source ◽

Low Pressure ◽

Inductively Coupled ◽

Diamond Chemical Vapor Deposition

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Hardness and Young’s modulus of high-quality cubic boron nitride films grown by chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1534625 ◽

2003 ◽

Vol 93 (3) ◽

pp. 1515-1519 ◽

Cited By ~ 37

Author(s):

X. Jiang ◽

J. Philip ◽

W. J. Zhang ◽

P. Hess ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Young’S Modulus ◽

Vapor Deposition ◽

Young's Modulus ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

High Quality ◽

Boron Nitride Films

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High-quality, faceted cubic boron nitride films grown by chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1428762 ◽

2001 ◽

Vol 79 (27) ◽

pp. 4530-4532 ◽

Cited By ~ 32

Author(s):

W. J. Zhang ◽

X. Jiang ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

High Quality ◽

Boron Nitride Films

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Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1597981 ◽

2003 ◽

Vol 83 (6) ◽

pp. 1207-1209 ◽

Cited By ~ 41

Author(s):

J. B. O. Caughman ◽

L. R. Baylor ◽

M. A. Guillorn ◽

V. I. Merkulov ◽

D. H. Lowndes ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanofibers ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Vertically Aligned ◽

Vertically Aligned Carbon Nanofibers

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Thermal Stability of Cubic Boron Nitride Films Deposited by Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.200702009 ◽

2007 ◽

Vol 38 (2) ◽

Author(s):

J. Yu ◽

Z. Zheng ◽

H. C. Ong ◽

K. Y. Wong ◽

S. Matsumoto ◽

...

Keyword(s):

Thermal Stability ◽

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Boron Nitride Films ◽

Thermal Stability Of

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