Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

2003 ◽  
Vol 83 (6) ◽  
pp. 1207-1209 ◽  
Author(s):  
J. B. O. Caughman ◽  
L. R. Baylor ◽  
M. A. Guillorn ◽  
V. I. Merkulov ◽  
D. H. Lowndes ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Nanofibers ◽  
Vapor Deposition ◽  
Inductively Coupled Plasma ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Inductively Coupled ◽  
Vertically Aligned ◽  
Vertically Aligned Carbon Nanofibers

Synthesis of Vertically Aligned Carbon Nanofibers-Carbon Nanowalls by Plasma-Enhanced Chemical Vapor Deposition

2013 ◽  
Vol 13 (3) ◽  
pp. 1956-1960
Author(s):  
Atsuto Okamoto ◽  
Kei Tanaka ◽  
Masamichi Yoshimura ◽  
Kazuyuki Ueda ◽  
Pradip Ghosh ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Nanofibers ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Vertically Aligned ◽  
Carbon Nanowalls ◽  
Vertically Aligned Carbon Nanofibers

Effects of spatial separation on the growth of vertically aligned carbon nanofibers produced by plasma-enhanced chemical vapor deposition

2002 ◽  
Vol 80 (3) ◽  
pp. 476-478 ◽  
Author(s):  
Vladimir I. Merkulov ◽  
Anatoli V. Melechko ◽  
Michael A. Guillorn ◽  
Douglas H. Lowndes ◽  
Michael L. Simpson
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Nanofibers ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Spatial Separation ◽  
Vertically Aligned ◽  
Vertically Aligned Carbon Nanofibers

Formation of loops on the surface of carbon nanofibers synthesized by plasma-enhanced chemical vapor deposition using an inductively coupled plasma reactor

2006 ◽  
Vol 21 (10) ◽  
pp. 2440-2443 ◽  
Author(s):  
Shinn-Shyong Tzeng ◽  
Pei-Lun Wang ◽  
Ting-Yu Wu ◽  
Kao-Shao Chen ◽  
San-Der Chyou ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Nanofibers ◽  
Vapor Deposition ◽  
Inductively Coupled Plasma ◽  
Plasma Reactor ◽  
Chemical Vapor ◽  
High Density ◽  
Inductively Coupled ◽  
Thermal Cvd ◽  
Density Plasma

Carbon nanofibers (CNFs) were synthesized by both high-density plasma-enhanced chemical vapor deposition (CVD) and thermal CVD. The growth in the former was carried out in an inductively coupled plasma (ICP) reactor. The multilayer loop structure, which was reported to be found on both the inner and outer surfaces of cup-stacked-type CNFs grown using thermal CVD only after heat treatment above 1500 °C, was observed in the as-grown CNFs only on the outer surface using ICP-CVD. The dangling bonds caused by plasma etching and the bonding between edge carbon atoms aided by the high-density plasma are considered the main reasons of the formation of multilayer loops.

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