Optical beam deflection imaging of the electron beam interaction volume in semiconductors

1993 ◽  
Vol 63 (5) ◽  
pp. 645-647 ◽  
Author(s):  
G. Y. Chang ◽  
R. B. Givens ◽  
J. W. M. Spicer ◽  
R. Osiander ◽  
J. C. Murphy
Keyword(s):  
Electron Beam ◽  
Optical Beam ◽  
Beam Deflection ◽  
Interaction Volume ◽  
Beam Interaction

Quantitative particle analysis: fact or fiction

1996 ◽  
Vol 54 ◽  
pp. 496-497
Author(s):  
J.A. Small ◽  
J.T. Armstrong
Keyword(s):  
Electron Beam ◽  
Electron Probe ◽  
Microprobe Analysis ◽  
Particle Analysis ◽  
Analytical Challenge ◽  
X Ray ◽  
Interaction Volume ◽  
Elemental Concentrations ◽  
Conventional Analysis ◽  
Beam Interaction

In conventional microprobe analysis, the samples and standards have a controlled geometry, i.e. flat polished, and infinitely large with respect to the electron beam interaction volume. As a result, the measured x-ray intensities for the analyzed elements vary in a predictable manner with composition and the various elemental concentrations can be calculated from a choice of several analytical algorithms. Unlike conventional analysis, the quantitative analysis of particles with the electron probe presents a very difficult analytical challenge. Most particles are irregularly shaped and do not have controlled geometries. In addition, depending on their size, they may not be “infinitely” thick with respect to the electron beam. Because of the random sizes and shapes, the emitted x-ray intensity from particles may be greater than or less than the intensities from a flat conventional sample of the same composition. A diagram from Armstrong of the interaction between an electron beam and a particle is shown in Fig. 1 and illustrates the “particle” effects that make quantitative particle analysis so difficult.

High Resolution Scanning Electron Microscopy

1991 ◽  
Vol 49 ◽  
pp. 478-479
Author(s):  
David Joy ◽  
James Pawley
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
Scanning Electron Microscope ◽  
Electron Probe ◽  
Impact Point ◽  
Interaction Volume ◽  
Scanning Electron

The scanning electron microscope (SEM) builds up an image by sampling contiguous sub-volumes near the surface of the specimen. A fine electron beam selectively excites each sub-volume and then the intensity of some resulting signal is measured. The spatial resolution of images made using such a process is limited by at least three factors. Two of these determine the size of the interaction volume: the size of the electron probe and the extent to which detectable signal is excited from locations remote from the beam impact point. A third limitation emerges from the fact that the probing beam is composed of a finite number of discrete particles and therefore that the accuracy with which any detectable signal can be measured is limited by Poisson statistics applied to this number (or to the number of events actually detected if this is smaller).

Development of multi-environment dual-probe atomic force microscopy system using optical beam deflection sensors with vertically incident laser beams

2013 ◽  
Vol 84 (8) ◽  
pp. 083701 ◽  
Author(s):  
Eika Tsunemi ◽  
Kei Kobayashi ◽  
Noriaki Oyabu ◽  
Masaharu Hirose ◽  
Yoshiko Takenaka ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Optical Beam ◽  
Laser Beams ◽  
Beam Deflection ◽  
Incident Laser ◽  
Force Microscopy ◽  
Atomic Force ◽  
Dual Probe

Multi-Probe Atomic Force Microscopy with Optical Beam Deflection Method

2007 ◽  
Vol 46 (8B) ◽  
pp. 5636-5638 ◽  
Author(s):  
Eika Tsunemi ◽  
Nobuo Satoh ◽  
Yuji Miyato ◽  
Kei Kobayashi ◽  
Kazumi Matsushige ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Optical Beam ◽  
Beam Deflection ◽  
Force Microscopy ◽  
Atomic Force

Transmission-Line Model and Propagation in a Negative-Index, Parallel-Plate Metamaterial to Boost Electron-Beam Interaction

2014 ◽  
Vol 62 (6) ◽  
pp. 3212-3221 ◽  
Author(s):  
Nicholas Aaron Estep ◽  
Amir Nader Askarpour ◽  
Simeon Trendafilov ◽  
Gennady Shvets ◽  
Andrea Alu
Keyword(s):  
Electron Beam ◽  
Transmission Line ◽  
Parallel Plate ◽  
Negative Index ◽  
Transmission Line Model ◽  
Line Model ◽  
Beam Interaction

Fast and accurate electron-beam deflection circuits using two kinds of D-A converters

1981 ◽  
Vol 64 (2) ◽  
pp. 101-107
Author(s):  
Yoshifusa Wada ◽  
Masatoshi Migitaka ◽  
Yasuhide Hisamoto ◽  
Koichiro Mizukami
Keyword(s):  
Electron Beam ◽  
Beam Deflection

A two-axis in-plane motion measurement system based on optical beam deflection

2013 ◽  
Vol 84 (10) ◽  
pp. 105001 ◽  
Author(s):  
R. Sriramshankar ◽  
R. Sri Muthu Mrinalini ◽  
G. R. Jayanth
Keyword(s):  
Measurement System ◽  
Plane Motion ◽  
Optical Beam ◽  
Beam Deflection ◽  
Motion Measurement
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