Reactive ion etching end‐point determination by plasma impedance monitoring

1992 ◽  
Vol 61 (16) ◽  
pp. 1912-1914 ◽  
Author(s):  
V. Patel ◽  
B. Singh ◽  
J. H. Thomas
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
End Point ◽  
Plasma Impedance ◽  
Impedance Monitoring ◽  
Point Determination

End-point Detection of Reactive Ion Etching by Plasma Impedance Monitoring

2001 ◽  
Vol 40 (Part 1, No. 3A) ◽  
pp. 1457-1462 ◽  
Author(s):  
Masaaki Kanoh ◽  
Masashi Yamage ◽  
Hiroyuki Takada
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
End Point ◽  
Plasma Impedance ◽  
Impedance Monitoring ◽  
End Point Detection ◽  
Point Detection

End Point Detection for Reactive Ion Etching of Aluminum

1984 ◽  
Vol 131 (1) ◽  
pp. 214-215 ◽  
Author(s):  
Kwang O. Park ◽  
Fredrick C. Rock
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
End Point ◽  
End Point Detection ◽  
Point Detection
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