N‐channel enhancement mode field‐effect transistors in Hg1−xCdxTe grown by organometallic epitaxy (direct alloy growth process)

1991 ◽  
Vol 59 (13) ◽  
pp. 1575-1577 ◽  
Author(s):  
I. B. Bhat ◽  
K. K. Parat ◽  
H. Ehsani ◽  
S. K. Ghandhi
2019 ◽  
Vol 52 (22) ◽  
pp. 225102
Author(s):  
Zhuodong Li ◽  
You Meng ◽  
Chao Wang ◽  
Youchao Cui ◽  
Zhao Yao ◽  
...  

1995 ◽  
Vol 410 ◽  
Author(s):  
M. W. Dryfuse ◽  
M. Tabib-Azar

ABSTRACTAn explicit analytical expression relating the interface trap densities and transconductance is derived for enhancement mode field effect transistors without any simplifying assumptions regarding the energy distribution of traps. Using this relationship, the interface trap densities were calculated from transconductance data and compared to experimental data and that provided in the literature. Our expression provides a simple and convenient method to reliably estimate interface traps densities from the readily available transconductance data provided in the pertinent literature.


2016 ◽  
Vol 4 (22) ◽  
pp. 5102-5108 ◽  
Author(s):  
Marolop Simanullang ◽  
G. Bimananda M. Wisna ◽  
Koichi Usami ◽  
Wei Cao ◽  
Yukio Kawano ◽  
...  

The experimental demonstration of high-performance p-type enhancement-mode field-effect transistors fabricated from undoped and catalyst-free germanium nanowires.


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