Heterojunction bipolar transistor fabrication using Si1−xGexselective epitaxial growth by gas source silicon molecular beam epitaxy

1990 ◽  
Vol 56 (26) ◽  
pp. 2645-2647 ◽  
Author(s):  
Hiroyuki Hirayama ◽  
Masayuki Hiroi ◽  
Kazuhisa Koyama ◽  
Toru Tatsumi
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