Grain growth and size distribution in ion‐irradiated chemical vapor deposited amorphous silicon

1989 ◽  
Vol 55 (2) ◽  
pp. 109-111 ◽  
Author(s):  
C. Spinella ◽  
S. Lombardo ◽  
S. U. Campisano
Keyword(s):  
Amorphous Silicon ◽  
Size Distribution ◽  
Grain Growth ◽  
Chemical Vapor ◽  
Chemical Vapor Deposited

Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films

1993 ◽  
Vol 32 (Part 2, No.1A/B) ◽  
pp. L20-L23 ◽  
Author(s):  
Toshiaki Shiraiwa ◽  
Osamu Sugiura ◽  
Hiroshi Kanoh ◽  
Norihito Asai ◽  
Koh-ichi Usami ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited

Hydrogen-Radical Annealing of Chemical Vapor-Deposited Amorphous Silicon Films

1990 ◽  
Vol 29 (Part 2, No. 12) ◽  
pp. L2171-L2173 ◽  
Author(s):  
Yasutaka Uchida ◽  
Hiroshi Kanoh ◽  
Osamu Sugiura ◽  
Masakiyo Matsumura
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Hydrogen Radical

scholarly journals Chemical Vapor Deposited Amorphous Silicon For Use In Photothermal Conversion

1978 ◽  
Author(s):  
D. C. Booth ◽  
M. Janai ◽  
G. Weiser ◽  
D. D. Allred ◽  
B. O. Seraphin
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Photothermal Conversion ◽  
Chemical Vapor Deposited

Hydrogenation kinetics and defect termination of post‐plasma‐treated chemical‐vapor‐deposited amorphous silicon film

1989 ◽  
Vol 65 (8) ◽  
pp. 3061-3068 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Kenji Miyata ◽  
Nobutake Konishi ◽  
Takaya Suzuki
Keyword(s):  
Amorphous Silicon ◽  
Silicon Film ◽  
Chemical Vapor ◽  
Amorphous Silicon Film ◽  
Chemical Vapor Deposited ◽  
Hydrogenation Kinetics
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