Low‐temperature diamond deposition by microwave plasma‐enhanced chemical vapor deposition

1989 ◽  
Vol 55 (7) ◽  
pp. 631-633 ◽  
Author(s):  
Y. Liou ◽  
A. Inspektor ◽  
R. Weimer ◽  
R. Messier
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Diamond Deposition

Diamond deposition from fluorinated precursors using microwave‐plasma chemical vapor deposition

1995 ◽  
Vol 67 (16) ◽  
pp. 2379-2381 ◽  
Author(s):  
Ciaran A. Fox ◽  
Mark C. McMaster ◽  
Wen L. Hsu ◽  
Michael A. Kelly ◽  
Stig B. Hagstrom
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Diamond Deposition ◽  
Plasma Chemical Vapor Deposition

Growth of carbon nanotubes by microwave plasma-enhanced chemical vapor deposition at low temperature

2000 ◽  
Vol 18 (4) ◽  
pp. 1864-1868 ◽  
Author(s):  
Young Chul Choi ◽  
Dong Jae Bae ◽  
Young Hee Lee ◽  
Byung Soo Lee ◽  
Gyeong-Su Park ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor

In-situ Plasma Diagnosis of Chemical Species in Microwave Plasma-assisted Chemical Vapor Deposition for the Growth of Carbon Nanotubes Using CH4/H2/NH3 Gases

2000 ◽  
Vol 621 ◽  
Author(s):  
Y.S. Woo ◽  
I.T. Han ◽  
N.S. Lee ◽  
J.E. Jung ◽  
D.Y. Jeon ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Carbon Sources ◽  
Chemical Species ◽  
Chemical Vapor ◽  
Optical Emission ◽  
Multi Wall Carbon Nanotubes

ABSTRACTSynthesis of multi-wall carbon nanotubes (MWNTs) was attempted by microwave plasma enhanced chemical vapor deposition using CH4/H2/NH3 gases on Ni/Cr-coated glass at low temperature. The synthesis was investigated by optical emission spectroscopy and quadrupole mass spectroscopy. It was observed that MWNTs could be grown within a very restrictive range of gas compositions. An addition of a small amount of NH3 resulted in a decrease of C2H2, which can be used to estimate the amount of carbon sources in plasma for the growth of MWNTs, and an increase of CN and Hα radicals acting as etching species of carbon phases. These results show that carbon nanotubes can be grown only under an appropriate condition that the growing process surpasses the etching process. The optimum C2H2 /Hα ratio in a gas mixture was found to be between 1 and 3 for the MWNT growth at low temperature.

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