Low‐temperature laser photochemical vapor deposition of GaAs

1989 ◽  
Vol 54 (19) ◽  
pp. 1866-1868 ◽  
Author(s):  
P. K. York ◽  
J. G. Eden ◽  
J. J. Coleman ◽  
G. E. Fernández ◽  
K. J. Beernink
Keyword(s):  
Low Temperature ◽  
Vapor Deposition ◽  
Photochemical Vapor Deposition

Effects of SiH2Cl2 on low-temperature (≤200°C) Si epitaxy by photochemical vapor deposition

1994 ◽  
Vol 79-80 ◽  
pp. 215-219 ◽  
Author(s):  
Takayuki Oshima ◽  
Masashi Sano ◽  
Akira Yamada ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi
Keyword(s):  
Low Temperature ◽  
Vapor Deposition ◽  
Si Epitaxy ◽  
Photochemical Vapor Deposition

Epitaxial growth of silicon by photochemical vapor deposition at a very low temperature of 200 °C

1986 ◽  
Vol 49 (2) ◽  
pp. 79-81 ◽  
Author(s):  
Shoji Nishida ◽  
Tsunenori Shiimoto ◽  
Akira Yamada ◽  
Shiro Karasawa ◽  
Makoto Konagai ◽  
...  
Keyword(s):  
Low Temperature ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Photochemical Vapor Deposition ◽  
Very Low Temperature

Heavily B-Doped Epitaxial Si Films Grown by Photochemical Vapor Deposition at Very Low Temperature ( <200° C)

1995 ◽  
Vol 34 (Part 2, No. 11A) ◽  
pp. L1425-L1428 ◽  
Author(s):  
Takayuki Oshima ◽  
Katsuya Abe ◽  
Akira Yamada ◽  
Makoto Konagai
Keyword(s):  
Low Temperature ◽  
Vapor Deposition ◽  
Si Films ◽  
Photochemical Vapor Deposition ◽  
Very Low Temperature

Low-Temperature Silicon Epitaxial Growth by Photochemical Vapor Deposition Using Vacuum Ultraviolet Light

1987 ◽  
Vol 26 (Part 2, No. 7) ◽  
pp. L1189-L1192 ◽  
Author(s):  
Narishi Gonohe ◽  
Saburo Shimizu ◽  
Kouichi Tamagawa ◽  
Toshio Hayashi ◽  
Hiroyuki Yamakawa
Keyword(s):  
Low Temperature ◽  
Epitaxial Growth ◽  
Ultraviolet Light ◽  
Vapor Deposition ◽  
Vacuum Ultraviolet ◽  
Photochemical Vapor Deposition
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