Low Temperature Photochemical Vapor Deposition of SiO2Using 172 nm Xe2* Excimer Lamp Radiation with Three Oxidant Chemistries: O2, H2O/O2, and H2O2
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2007 ◽
Vol 46
(6A)
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pp. 3534-3536
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1994 ◽
Vol 79-80
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pp. 215-219
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1995 ◽
Vol 34
(Part 1, No. 8A)
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pp. 4024-4025
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1989 ◽
Vol 28
(Part 2, No. 12)
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pp. L2284-L2287
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