Growth and characterization of GaAs layers on Si substrates by migration‐enhanced molecular beam epitaxy

1988 ◽  
Vol 53 (24) ◽  
pp. 2435-2437 ◽  
Author(s):  
Jae‐Hoon Kim ◽  
John K. Liu ◽  
Gouri Radhakrishnan ◽  
Joseph Katz ◽  
Shiro Sakai ◽  
...  
2006 ◽  
Vol 200 (10) ◽  
pp. 3230-3234 ◽  
Author(s):  
W. Tong ◽  
M. Harris ◽  
B.K. Wagner ◽  
J.W. Yu ◽  
H.C. Lin ◽  
...  

1995 ◽  
Vol 150 ◽  
pp. 950-954 ◽  
Author(s):  
J. Zhang ◽  
X.M. Zhang ◽  
A. Matsumura ◽  
A. Marinopoulou ◽  
J. Hartung ◽  
...  

Author(s):  
J.B. Posthill ◽  
J. Tarn ◽  
T.P. Humphreys ◽  
K. Das ◽  
J.J. Wortman ◽  
...  

Because of several potential applications and advantages afforded by the heteroepitaxial GaAs-on-Silicon material system, several groups world-wide are attempting to grow device-quality GaAs on Si substrates.eg.1 Both metalorganic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE) growth techniques have been widely utilized to achieve heteroepitaxial growth. However, certain fundamental materials and growth problems have thus far prevented any group from achieving heteroepitaxial GaAs of a quality similar to that obtainable from bulk GaAs crystals. A high density of threading dislocations, microtwins/stacking faults, antiphase domain boundaries (APBs) and microfissures can form under non-ideal conditions. These defects result, in part, from stresses generated due to the ∼4% lattice mismatch and the different coefficients of thermal expansion between GaAs and Si.2 Ex-situ characterization of this materials system is essential to assess the material quality and to provide direction for future growth experiments. This contribution describes the TEM characterization methodology that we employ to analyze our GaAs grown on Si substrates by MBE.


1985 ◽  
Vol 58 (11) ◽  
pp. 4186-4193 ◽  
Author(s):  
P. Sheldon ◽  
B. G. Yacobi ◽  
K. M. Jones ◽  
D. J. Dunlavy

1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


2017 ◽  
Vol 9 (36) ◽  
pp. 30786-30796 ◽  
Author(s):  
Yoon-Ho Choi ◽  
Dong-Hyeok Lim ◽  
Jae-Hun Jeong ◽  
Dambi Park ◽  
Kwang-Sik Jeong ◽  
...  

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