Effect of N2-annealing on n-type Si metal–oxide–semiconductor capacitors by using liquid-phase deposition SiO2

2011 ◽  
Vol 6 (11) ◽  
pp. 944 ◽  
Author(s):  
Gwo-Huei Yang ◽  
Wen-Tse Chang ◽  
Jun-Dar Hwang ◽  
Jun-Hung Lin ◽  
Yu-Hung Chen
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