scholarly journals Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists

2019 ◽  
Vol 7 (29) ◽  
pp. 8803-8812 ◽  
Author(s):  
Nikhil Tiwale ◽  
Ashwanth Subramanian ◽  
Kim Kisslinger ◽  
Ming Lu ◽  
Jiyoung Kim ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
Vapor Phase ◽  
High Aspect Ratio ◽  
Pattern Transfer ◽  
Hybrid Nanocomposite ◽  
Performance Parameters ◽  
Next Generation ◽  
Transfer Capability

Novel positive-tone hybrid resists developed by vapor-phase inorganic infiltration feature fully tunable resist performance parameters and high-aspect-ratio pattern transfer capability.

Record high-aspect-ratio GaAs nano-grating lines grown by Hydride Vapor Phase Epitaxy (HVPE)

2013 ◽  
Vol 380 ◽  
pp. 93-98 ◽  
Author(s):  
E. Gil ◽  
Y. André ◽  
M.R. Ramdani ◽  
C. Fontaine ◽  
A. Trassoudaine ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
Vapor Phase ◽  
High Aspect Ratio ◽  
Vapor Phase Epitaxy ◽  
Hydride Vapor Phase Epitaxy

Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks

2019 ◽  
Vol 210 ◽  
pp. 8-13 ◽  
Author(s):  
Li-Ting Tseng ◽  
Dimitrios Kazazis ◽  
Xiaolong Wang ◽  
Carmen M. Popescu ◽  
Alex P.G. Robinson ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Pattern Transfer

X-Ray Fabrication of Repetitive Structures

1999 ◽  
Author(s):  
Yadong Liu ◽  
Paul Sheng
Keyword(s):  
Aspect Ratio ◽  
Process Planning ◽  
High Aspect Ratio ◽  
Pattern Transfer ◽  
Grid Structure ◽  
X Ray ◽  
Gear Teeth ◽  
Process Characteristics ◽  
Micro Level ◽  
Advanced Applications

Abstract The fabrication of repetitive mechanical structures in millimeter range by deep x-ray micromachining is reported in this paper. With higher energy and wider x-ray beam lines available, macro-sized mechanical structures with micro-level features can be fabricated by the modified LIGA process to meet the need on high aspect ratio, high precision components in advanced applications. Through metrology study, better understanding of the process characteristics is achieved to provide important information on error modes in pattern transfer, which could be ultimately used in product design and process planning. Case studies of a rectangular HESSI grid structure and involute gear teeth are presented.

CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures

2019 ◽  
Vol 11 (30) ◽  
pp. 27371-27377 ◽  
Author(s):  
Jeong Dong Kim ◽  
Munho Kim ◽  
Clarence Chan ◽  
Nerissa Draeger ◽  
James J. Coleman ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
Titanium Nitride ◽  
Vapor Phase ◽  
High Aspect Ratio ◽  
Chemical Etching ◽  
Silicon Nanostructures ◽  
Cmos Compatible
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