Computational modelling of atomic layer etching of chlorinated germanium surfaces by argon

2019 ◽  
Vol 21 (11) ◽  
pp. 5898-5902
Author(s):  
Shenli Zhang ◽  
Yihan Huang ◽  
Gulcin Tetiker ◽  
Saravanapriyan Sriraman ◽  
Alex Paterson ◽  
...  
Keyword(s):  
Computational Modelling ◽  
Atomic Layer ◽  
Ion Bombardment ◽  
Surface Layers ◽  
Bombardment Energy ◽  
Atomic Layer Etching

Cl ion bombardment energy is clearly responsible for disturbing Ge surface layers.

New insight into desorption step by Ar+ ion-bombardment during the atomic layer etching of silicon

2018 ◽  
Vol 36 (3) ◽  
pp. 031303 ◽  
Author(s):  
Sonam D. Sherpa ◽  
Peter L. G. Ventzek ◽  
Myungsuk Lee ◽  
Gyeong S. Hwang ◽  
Alok Ranjan
Keyword(s):  
Atomic Layer ◽  
Ion Bombardment ◽  
Atomic Layer Etching ◽  
Desorption Step ◽  
Insight Into

Damaged silicon contact layer removal using atomic layer etching for deep-nanoscale semiconductor devices

2013 ◽  
Vol 31 (6) ◽  
pp. 061310 ◽  
Author(s):  
Jong Kyu Kim ◽  
Sung Il Cho ◽  
Sung Ho Lee ◽  
Chan Kyu Kim ◽  
Kyung Suk Min ◽  
...  
Keyword(s):  
Semiconductor Devices ◽  
Atomic Layer ◽  
Contact Layer ◽  
Layer Removal ◽  
Atomic Layer Etching

Understanding time-resolved processes in atomic-layer etching of ultra-thin Al2O3 film using BCl3 and Ar neutral beam

2014 ◽  
Vol 105 (9) ◽  
pp. 093104 ◽  
Author(s):  
Young I. Jhon ◽  
Kyung S. Min ◽  
G. Y. Yeom ◽  
Young Min Jhon
Keyword(s):  
Atomic Layer ◽  
Neutral Beam ◽  
Al2o3 Film ◽  
Time Resolved ◽  
Atomic Layer Etching

Atomic scale surface engineering of micro- to nano-sized pharmaceutical particles for drug delivery applications

Nanoscale ◽  
2017 ◽  
Vol 9 (32) ◽  
pp. 11410-11417 ◽  
Author(s):  
D. Zhang ◽  
M. J. Quayle ◽  
G. Petersson ◽  
J. R. van Ommen ◽  
S. Folestad
Keyword(s):  
Drug Delivery ◽  
Atomic Layer Deposition ◽  
Surface Engineering ◽  
Atomic Layer ◽  
Atomic Scale ◽  
Ambient Conditions ◽  
Surface Layers ◽  
Layer Deposition ◽  
Atomic Surface ◽  
Scale Surface

Few atomic surface layers via atomic layer deposition under near ambient conditions significantly altered dissolution and dispersion of pharmaceutical particles.

(Invited) Volatile Products during Thermal Atomic Layer Etching of Metal Oxides and Elemental Metals

2021 ◽  
Vol MA2021-01 (21) ◽  
pp. 844-844
Author(s):  
Ann Lii-Rosales ◽  
Virginia Johnson ◽  
Sandeep Sharma ◽  
Andrew S Cavanagh ◽  
Steven M George
Keyword(s):  
Metal Oxides ◽  
Atomic Layer ◽  
Volatile Products ◽  
Atomic Layer Etching

Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO2

2021 ◽  
Author(s):  
Suresh Kondati Natarajan ◽  
Austin M. Cano ◽  
Jonathan L. Partridge ◽  
Steven M. George ◽  
Simon D. Elliott
Keyword(s):  
Atomic Layer ◽  
Process Window ◽  
Atomic Layer Etching
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