Damaged silicon contact layer removal using atomic layer etching for deep-nanoscale semiconductor devices

2013 ◽  
Vol 31 (6) ◽  
pp. 061310 ◽  
Author(s):  
Jong Kyu Kim ◽  
Sung Il Cho ◽  
Sung Ho Lee ◽  
Chan Kyu Kim ◽  
Kyung Suk Min ◽  
...  
Keyword(s):  
Semiconductor Devices ◽  
Atomic Layer ◽  
Contact Layer ◽  
Layer Removal ◽  
Atomic Layer Etching

Understanding time-resolved processes in atomic-layer etching of ultra-thin Al2O3 film using BCl3 and Ar neutral beam

2014 ◽  
Vol 105 (9) ◽  
pp. 093104 ◽  
Author(s):  
Young I. Jhon ◽  
Kyung S. Min ◽  
G. Y. Yeom ◽  
Young Min Jhon
Keyword(s):  
Atomic Layer ◽  
Neutral Beam ◽  
Al2o3 Film ◽  
Time Resolved ◽  
Atomic Layer Etching

(Invited) Volatile Products during Thermal Atomic Layer Etching of Metal Oxides and Elemental Metals

2021 ◽  
Vol MA2021-01 (21) ◽  
pp. 844-844
Author(s):  
Ann Lii-Rosales ◽  
Virginia Johnson ◽  
Sandeep Sharma ◽  
Andrew S Cavanagh ◽  
Steven M George
Keyword(s):  
Metal Oxides ◽  
Atomic Layer ◽  
Volatile Products ◽  
Atomic Layer Etching

Prediction and Validation of the Process Window for Atomic Layer Etching: HF Exposure on TiO2

2021 ◽  
Author(s):  
Suresh Kondati Natarajan ◽  
Austin M. Cano ◽  
Jonathan L. Partridge ◽  
Steven M. George ◽  
Simon D. Elliott
Keyword(s):  
Atomic Layer ◽  
Process Window ◽  
Atomic Layer Etching

scholarly journals Predicting synergy in atomic layer etching

2017 ◽  
Vol 35 (5) ◽  
pp. 05C302 ◽  
Author(s):  
Keren J. Kanarik ◽  
Samantha Tan ◽  
Wenbing Yang ◽  
Taeseung Kim ◽  
Thorsten Lill ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Atomic Layer Etching

Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants

2018 ◽  
Vol 30 (23) ◽  
pp. 8465-8475 ◽  
Author(s):  
Aziz I. Abdulagatov ◽  
Steven M. George
Keyword(s):  
Atomic Layer ◽  
Atomic Layer Etching

scholarly journals Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

2016 ◽  
Vol 34 (1) ◽  
pp. 01B101 ◽  
Author(s):  
Dominik Metzler ◽  
Chen Li ◽  
Sebastian Engelmann ◽  
Robert L. Bruce ◽  
Eric A. Joseph ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Atomic Layer Etching

scholarly journals Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4

2016 ◽  
Vol 34 (4) ◽  
pp. 041307 ◽  
Author(s):  
Chen Li ◽  
Dominik Metzler ◽  
Chiukin Steven Lai ◽  
Eric A. Hudson ◽  
Gottlieb S. Oehrlein
Keyword(s):  
Atomic Layer ◽  
Etching Selectivity ◽  
Atomic Layer Etching
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