scholarly journals Solution-processed resistive switching memory devices based on hybrid organic–inorganic materials and composites

2018 ◽  
Vol 20 (37) ◽  
pp. 23837-23846 ◽  
Author(s):  
Yingying Shan ◽  
Zhensheng Lyu ◽  
Xinwei Guan ◽  
Adnan Younis ◽  
Guoliang Yuan ◽  
...  

We review emerging low-cost solution-processed resistive random-access memory (ReRAM) made of either hybrid nanocomposites or hybrid organo-lead halide perovskites.

InfoMat ◽  
2020 ◽  
Author(s):  
Jiayu Di ◽  
Jianhui Du ◽  
Zhenhua Lin ◽  
Shengzhong (Frank) Liu ◽  
Jianyong Ouyang ◽  
...  

RSC Advances ◽  
2017 ◽  
Vol 7 (21) ◽  
pp. 12984-12989 ◽  
Author(s):  
Ying-Chen Chen ◽  
Yao-Feng Chang ◽  
Xiaohan Wu ◽  
Fei Zhou ◽  
Meiqi Guo ◽  
...  

Schematic of RESET analysis by dynamic conductance of I–V curve in HfOx-based resistive switching memory.


2016 ◽  
Vol 1 (6) ◽  
Author(s):  
Amit Prakash ◽  
Hyunsang Hwang

Abstract Multilevel per cell (MLC) storage in resistive random access memory (ReRAM) is attractive in achieving high-density and low-cost memory and will be required in future. In this chapter, MLC storage and resistance variability and reliability of multilevel in ReRAM are discussed. Different MLC operation schemes with their physical mechanisms and a comprehensive analysis of resistance variability have been provided. Various factors that can induce variability and their effect on the resistance margin between the multiple resistance levels are assessed. The reliability characteristics and the impact on MLC storage have also been assessed.


RSC Advances ◽  
2017 ◽  
Vol 7 (19) ◽  
pp. 11585-11590 ◽  
Author(s):  
Cong Ye ◽  
Jia-Ji Wu ◽  
Chih-Hung Pan ◽  
Tsung-Ming Tsai ◽  
Kuan-Chang Chang ◽  
...  

A low temperature supercritical fluid nitridation (SCF-nitridation) technique was investigated to dope nitrogen into a indium-tin-oxide (ITO) electrode to boost the performance of hafnium oxide resistive random access memory (RRAM).


2014 ◽  
Vol 104 (9) ◽  
pp. 093508 ◽  
Author(s):  
Doo Hyun Yoon ◽  
Si Joon Kim ◽  
Joohye Jung ◽  
Seung Jin Heo ◽  
Hyun Jae Kim

2015 ◽  
Vol 29 (35n36) ◽  
pp. 1550244 ◽  
Author(s):  
Yingtao Li ◽  
Rongrong Li ◽  
Peng Yuan ◽  
Xiaoping Gao ◽  
Enzi Chen

In this paper, a low-cost Ti/TiO2/HfO2/TiO2/Ti stack structure is proposed as a selector for bipolar resistive random access memory (RRAM) cross-bar array applications. We demonstrate reproducible resistive switching characteristics with significant nonlinearity and good uniformity in the one selector and one resistor (1S1R) structure device that integrate the bidirectional selector with a bipolar Pt/Ti/HfO2/Pt RRAM device. These results provide a good point of reference for evaluating the potential low-cost applications in bipolar RRAM cross-bar array.


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