Effect of the nitrogen–oxygen ratio on the position of N atoms in the TiO2lattice of N-doped TiO2thin films prepared by DC magnetron sputtering

CrystEngComm ◽  
2018 ◽  
Vol 20 (29) ◽  
pp. 4133-4140 ◽  
Author(s):  
Haihua Wu ◽  
Dingyu Yang ◽  
Xinghua Zhu ◽  
Peng Gu ◽  
Hui Sun ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Glass Substrate ◽  
Dc Magnetron Sputtering ◽  
Nitrogen Doped ◽  
Oxygen Ratio

The nitrogen-doped TiO2thin films are deposited on the glass substrate by using a direct-current (DC) magnetron sputtering technique.

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

Photoelectrochemical properties of nitrogen-doped indium tin oxide thin films prepared by reactive DC magnetron sputtering

2009 ◽  
Vol 518 (5) ◽  
pp. 1581-1584 ◽  
Author(s):  
Kee-Rong Wu ◽  
Chung-Wei Yeh ◽  
Chung-Hsuang Hung ◽  
Li-Hsun Cheng ◽  
Chih-Yuan Chung
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Photoelectrochemical Properties ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Nitrogen Doped

Effects of annealing ambient on oxygen vacancies and phase transition temperature of VO2 thin films

RSC Advances ◽  
2016 ◽  
Vol 6 (83) ◽  
pp. 79383-79388 ◽  
Author(s):  
H. Y. Xu ◽  
Y. H. Huang ◽  
S. Liu ◽  
K. W. Xu ◽  
F. Ma ◽  
...  
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Transition Temperature ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Room Temperature ◽  
Oxygen Vacancies ◽  
Dc Magnetron Sputtering ◽  
Si Substrates ◽  
Vo2 Thin Films

VO2 thin films are prepared on Si substrates by direct-current (DC) magnetron sputtering at room temperature and annealed in vacuum at different argon pressures.

The Effects of SiO, SiON on IZO Thin Film Deposited by DCMG Method

2007 ◽  
Vol 124-126 ◽  
pp. 455-458
Author(s):  
Seong Hoon Kim ◽  
Han Ki Yoon ◽  
Riichi Murakami
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Content ◽  
Glass Substrate ◽  
Single Layer ◽  
Target Type ◽  
Dc Magnetron Sputtering ◽  
Izo Thin Film ◽  
Pet Substrate

The thin films of SiO and SiON were deposited individually by the inclination opposite target type DC magnetron sputtering equipment onto the glass substrate. And it was deposited IZO(In2O3 (90wt.%) + ZnO(10wt.%)) on those films. The effects of SiO and SiON were investigated on properties of IZO thin films. AFM images of IZO thin film included SiON film were shown smoother surfaces than that included SiO film. Multi layers of IZO were shown good properties because it have high transmissivity. Resistivity is in inverse proportion to Mobility. If it deposited SiO and SiON, generate layer of change between two layers(SiO or SiON + Substrate). Layer of change influenced resistance because Oxygen content was more than single layer of IZO. In case of using PET substrate, it influenced stronger than Glass substrate for rigid gas permeable and osmosis.

Visible light-active nitrogen-doped TiO2 thin films prepared by DC magnetron sputtering used as a photocatalyst

2008 ◽  
Vol 33 (2) ◽  
pp. 277-281 ◽  
Author(s):  
K. Prabakar ◽  
T. Takahashi ◽  
T. Nezuka ◽  
K. Takahashi ◽  
T. Nakashima ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Visible Light ◽  
Dc Magnetron Sputtering ◽  
Tio2 Thin Films ◽  
Active Nitrogen ◽  
Doped Tio2 ◽  
Nitrogen Doped ◽  
Visible Light Active

A New Solar Selective Absorbing Structure of Al-Al2O3 Cermet Composite Films by Pulsed Direct Current Magnetron Sputtering

2008 ◽  
Vol 53-54 ◽  
pp. 349-353 ◽  
Author(s):  
Li Wei Zhu ◽  
Yu Dong Feng ◽  
Y. Wang ◽  
Z.M. Wang ◽  
K. Zhao ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Composite Films ◽  
Metal Distribution ◽  
Dc Magnetron Sputtering ◽  
Thermal Emittance ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

Thin films composed of mixtures of metals and dielectric are being considered for use as solar selective coatings for a various applications. By controlling the metal distribution, the solar selective coatings can be designed to have the combined properties of high absorptance, and low infrared emittance. We have studied the preparation of the Al-Al2O3 cermet composite films deposited on the flexible Kapton substrate by pulsed direct current (DC) magnetron sputtering technique. The complex films include infrared reflective layers, interference absorptive layers, and anti-reflective layers. The measurements of the samples show that the spectral absorptance in the region of 0.2~2.5μm and thermal emittance in the region of 2.5~25μm were 92% and 7%, respectively.

scholarly journals ITO thin films prepared by DC magnetron sputtering method using ITO target. Preparation of ITO films on low temperature glass substrate.

Shinku ◽  
1989 ◽  
Vol 32 (3) ◽  
pp. 336-340
Author(s):  
Yoshiyuki TSUDA ◽  
Hideaki YASUI ◽  
Hidenobu SINTAKU ◽  
Hiroyoshi TANAKA ◽  
Masahide YOKOYAMA
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Glass Substrate ◽  
Dc Magnetron Sputtering ◽  
Target Preparation ◽  
Ito Thin Films ◽  
Ito Films
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