Ultralow power switching in a silicon-rich SiNy/SiNx double-layer resistive memory device
2017 ◽
Vol 19
(29)
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pp. 18988-18995
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Keyword(s):
Here we demonstrate low-power resistive switching in a Ni/SiNy/SiNx/p++-Si device by proposing a double-layered structure (SiNy/SiNx), where the two SiN layers have different trap densities.
2007 ◽
Vol 46
(4B)
◽
pp. 2175-2179
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2017 ◽
Vol 5
(37)
◽
pp. 9799-9805
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Keyword(s):
2019 ◽
Vol 7
(4)
◽
pp. 843-852
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Keyword(s):
2016 ◽
Vol 360
◽
pp. 338-341
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Keyword(s):
Keyword(s):
2017 ◽
Vol 4
(6)
◽
pp. 065901
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