Role of interfacial layer on complementary resistive switching in the TiN/HfOx/TiN resistive memory device
2017 ◽
Vol 5
(37)
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pp. 9799-9805
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2019 ◽
Vol 7
(4)
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pp. 843-852
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2017 ◽
Vol 19
(29)
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pp. 18988-18995
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2019 ◽
Vol 14
(3)
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pp. 1900646
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2011 ◽
Vol 11
(2)
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pp. e35-e39
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2018 ◽
Vol 57
(4S)
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pp. 04FE16
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2016 ◽
Vol 380
(44)
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pp. 3743-3747
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2018 ◽
Vol 57
(6)
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pp. 064202
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Keyword(s):