Flexible ultraviolet photodetectors with ZnO nanowire networks fabricated by large area controlled roll-to-roll processing

2016 ◽  
Vol 4 (34) ◽  
pp. 7948-7958 ◽  
Author(s):  
Janghoon Park ◽  
Jongsu Lee ◽  
Youngwook Noh ◽  
Kee-Hyun Shin ◽  
Dongjin Lee
Keyword(s):  
Processing Method ◽  
Zno Nanowire ◽  
Large Area ◽  
Uv Photodetectors ◽  
Flexible Films ◽  
Roll To Roll ◽  
Nanowire Networks ◽  
Ultraviolet Photodetectors

Ultraviolet (UV) photodetectors containing flexible films were fabricated by a roll-to-roll processing method.

scholarly journals Nanonet: Low-temperature-processed tellurium nanowire network for scalable p-type field-effect transistors and a highly sensitive phototransistor array

2021 ◽  
Vol 13 (1) ◽  
Author(s):  
Muhammad Naqi ◽  
Kyung Hwan Choi ◽  
Hocheon Yoo ◽  
Sudong Chae ◽  
Bum Jun Kim ◽  
...  
Keyword(s):  
Low Temperature ◽  
Field Effect ◽  
High Performance ◽  
Field Effect Transistors ◽  
Optical Measurements ◽  
Electrical Performance ◽  
Large Area ◽  
Nanowire Network ◽  
P Type ◽  
Nanowire Networks

AbstractLow-temperature-processed semiconductors are an emerging need for next-generation scalable electronics, and these semiconductors need to feature large-area fabrication, solution processability, high electrical performance, and wide spectral optical absorption properties. Although various strategies of low-temperature-processed n-type semiconductors have been achieved, the development of high-performance p-type semiconductors at low temperature is still limited. Here, we report a unique low-temperature-processed method to synthesize tellurium nanowire networks (Te-nanonets) over a scalable area for the fabrication of high-performance large-area p-type field-effect transistors (FETs) with uniform and stable electrical and optical properties. Maximum mobility of 4.7 cm2/Vs, an on/off current ratio of 1 × 104, and a maximum transconductance of 2.18 µS are achieved. To further demonstrate the applicability of the proposed semiconductor, the electrical performance of a Te-nanonet-based transistor array of 42 devices is also measured, revealing stable and uniform results. Finally, to broaden the applicability of p-type Te-nanonet-based FETs, optical measurements are demonstrated over a wide spectral range, revealing an exceptionally uniform optical performance.

scholarly journals Low-Cost, Large-Area, Facile, and Rapid Fabrication of Aligned ZnO Nanowire Device Arrays

2016 ◽  
Vol 8 (21) ◽  
pp. 13466-13471 ◽  
Author(s):  
Gerard Cadafalch Gazquez ◽  
Sidong Lei ◽  
Antony George ◽  
Hemtej Gullapalli ◽  
Bernard A. Boukamp ◽  
...  
Keyword(s):  
Low Cost ◽  
Zno Nanowire ◽  
Large Area ◽  
Rapid Fabrication ◽  
Nanowire Device

An Investigation onto Polydimethylsiloxane (PDMS) Printing Plate of Multiple Functional Solid Line by Flexographic

2013 ◽  
Vol 844 ◽  
pp. 158-161 ◽  
Author(s):  
M.I. Maksud ◽  
Mohd Sallehuddin Yusof ◽  
M. Mahadi Abdul Jamil
Keyword(s):  
Laser Ablation ◽  
Line Width ◽  
High Speed ◽  
Printed Electronics ◽  
Low Cost ◽  
Flexible Substrates ◽  
Large Area ◽  
Printing Plate ◽  
Roll To Roll ◽  
Printing Processes

Recently low cost production is vital to produce printed electronics by roll to roll manufacturing printing process like a flexographic. Flexographic has a high speed technique which commonly used for printing onto large area flexible substrates. However, the minimum feature sizes achieved with roll to roll printing processes, such as flexographic is in the range of fifty microns. The main contribution of this limitation is photopolymer flexographic plate unable to be produced finer micron range due to film that made by Laser Ablation Mask (LAMs) technology not sufficiently robust and consequently at micron ranges line will not be formed on the printing plate. Hence, polydimethylsiloxane (PDMS) is used instead of photopolymer. Printing trial had been conducted and multiple solid lines successfully printed for below fifty microns line width with no interference between two adjacent lines of the printed images.

scholarly journals Uniform Pressing Mechanism in Large-Area Roll-to-Roll Nanoimprint Lithography Process

2021 ◽  
Vol 11 (20) ◽  
pp. 9571
Author(s):  
Ga Eul Kim ◽  
Hyuntae Kim ◽  
Kyoohee Woo ◽  
Yousung Kang ◽  
Seung-Hyun Lee ◽  
...  
Keyword(s):  
Contact Pressure ◽  
Nanoimprint Lithography ◽  
Applied Pressure ◽  
Machine Learning Techniques ◽  
Conventional System ◽  
Large Area ◽  
High Productivity ◽  
Roll To Roll ◽  
Learning Techniques ◽  
Roller Machine

We aimed to increase the processing area of the roll-to-roll (R2R) nanoimprint lithography (NIL) process for high productivity, using a long roller. It is common for a long roller to have bending deformation, geometric errors and misalignment. This causes the non-uniformity of contact pressure between the rollers, which leads to defects such as non-uniform patterning. The non-uniformity of the contact pressure of the conventional R2R NIL system was investigated through finite element (FE) analysis and experiments in the conventional system. To solve the problem, a new large-area R2R NIL uniform pressing system with five multi-backup rollers was proposed and manufactured instead of the conventional system. As a preliminary experiment, the possibility of uniform contact pressure was confirmed by using only the pressure at both ends and one backup roller in the center. A more even contact pressure was achieved by using all five backup rollers and applying an appropriate pushing force to each backup roller. Machine learning techniques were applied to find the optimal combination of the pushing forces. In the conventional pressing process, it was confirmed that pressure deviation of the contact area occurred at a level of 44%; when the improved system was applied, pressure deviation dropped to 5%.

OLED Manufacturing on Flexible Substrates Towards Roll-to-Roll

MRS Advances ◽  
2019 ◽  
Vol 4 (24) ◽  
pp. 1367-1375 ◽  
Author(s):  
Dongxiang Wang ◽  
Jacqueline Hauptmann ◽  
Christian May
Keyword(s):  
High Throughput ◽  
Present Status ◽  
Manufacturing Cost ◽  
Flexible Substrates ◽  
Large Area ◽  
Thin Glass ◽  
Production Capability ◽  
Roll To Roll ◽  
Pet Film

ABSTRACTLarge area lighting OLEDs manufactured in a Roll-to-Roll (R2R) fashion enable the well-longed production capability with considerably high throughput based on flexible substrates, hence largely reduced OLED manufacturing cost. This paper will outline the present status of R2R OLED fabrication on ultra-thin glass with the focus on transparent OLED devices and how to perform segmentation by printing of silver- and dielectric pastes. Ultra-thin glass (UTG) is laminated on a PET film to avoid fabrication interruptions when glass cracks occur during the Roll-to-Roll process. The R2R fabricated flexible OLEDs also show key-values comparable to conventional OLEDs fabricated on small rigid glass in lab-scale.

Large-area Deposition of Amorphous Silicon Alloys Using a Roll-to-roll Operation

2005 ◽  
Vol 870 ◽  
Author(s):  
Subhendu Guha ◽  
Jeffrey Yang
Keyword(s):  
Amorphous Silicon ◽  
Triple Junction ◽  
Stainless Steel Substrate ◽  
Steel Substrate ◽  
Chemical Vapor ◽  
Large Area ◽  
Silicon Alloys ◽  
Roll To Roll ◽  
Layer Structures ◽  
Area Deposition

AbstractLarge-area deposition of thin-film amorphous silicon alloy triple-junction solar cells on lightweight and flexible stainless steel substrate is described. The proprietary roll-to-roll operation enables continuous depositions of sophisticated multi-layer structures. The deposition methods include sputtering and plasma-enhanced chemical vapor depositions. Spectrumsplitting triple-junction solar cell design, manufacturing processes, and product applications are presented.

The controllable deposition of large area roll-to-roll sputtered ito thin films for photovoltaic applications

2020 ◽  
Vol 146 ◽  
pp. 1549-1559 ◽  
Author(s):  
Yasemin Demirhan ◽  
Hasan Koseoglu ◽  
Fulya Turkoglu ◽  
Zemzem Uyanik ◽  
Mehtap Ozdemir ◽  
...  
Keyword(s):  
Thin Films ◽  
Large Area ◽  
Roll To Roll ◽  
Photovoltaic Applications ◽  
Ito Thin Films
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