scholarly journals Low-Cost, Large-Area, Facile, and Rapid Fabrication of Aligned ZnO Nanowire Device Arrays

2016 ◽  
Vol 8 (21) ◽  
pp. 13466-13471 ◽  
Author(s):  
Gerard Cadafalch Gazquez ◽  
Sidong Lei ◽  
Antony George ◽  
Hemtej Gullapalli ◽  
Bernard A. Boukamp ◽  
...  
Keyword(s):  
Low Cost ◽  
Zno Nanowire ◽  
Large Area ◽  
Rapid Fabrication ◽  
Nanowire Device

scholarly journals Low-Temperature Rapid Fabrication of ZnO Nanowire UV Sensor Array by Laser-Induced Local Hydrothermal Growth

2013 ◽  
Vol 2013 ◽  
pp. 1-7 ◽  
Author(s):  
Sukjoon Hong ◽  
Junyeob Yeo ◽  
Wanit Manorotkul ◽  
Gunho Kim ◽  
Jinhyeong Kwon ◽  
...  
Keyword(s):  
Gold Electrode ◽  
Sensor Array ◽  
Low Cost ◽  
Nanowire Array ◽  
Hydrothermal Growth ◽  
Zno Nanowire ◽  
Uv Sensor ◽  
Uv Illumination ◽  
Rapid Fabrication ◽  
Facile Fabrication

We demonstrate ZnO nanowire based UV sensor by laser-induced hydrothermal growth of ZnO nanowire. By inducing a localized temperature rise using focused laser, ZnO nanowire array at~15 μm size consists of individual nanowires with~8 μm length and 200~400 nm diameter is readily synthesized on gold electrode within 30 min at the desired position. The laser-induced growth process is consecutively applied on two different points to bridge the micron gap between the electrodes. The resultant photoconductive ZnO NW interconnections display 2~3 orders increase in the current upon the UV exposure at a fixed voltage bias. It is also confirmed that the amount of photocurrent can be easily adjusted by changing the number of ZnO NW array junctions. The device exhibits clear response to the repeated UV illumination, suggesting that this process can be usefully applied for the facile fabrication of low-cost UV sensor array.

Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

2020 ◽  
Vol 90 (3) ◽  
pp. 30502
Author(s):  
Alessandro Fantoni ◽  
João Costa ◽  
Paulo Lourenço ◽  
Manuela Vieira
Keyword(s):  
Amorphous Silicon ◽  
High Throughput Screening ◽  
Simulation Analysis ◽  
Low Cost ◽  
Deposition Process ◽  
Large Area ◽  
Sidewall Roughness ◽  
Sensing Applications ◽  
Fabrication Defects ◽  
The Impact

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.

A novel low cost texturization method for large area commercial mono-crystalline silicon solar cells

2006 ◽  
Vol 90 (20) ◽  
pp. 3557-3567 ◽  
Author(s):  
U. Gangopadhyay ◽  
K.H. Kim ◽  
S.K. Dhungel ◽  
U. Manna ◽  
P.K. Basu ◽  
...  
Keyword(s):  
Solar Cells ◽  
Crystalline Silicon ◽  
Low Cost ◽  
Silicon Solar Cells ◽  
Large Area ◽  
Crystalline Silicon Solar Cells

scholarly journals Superhydrophobicity and Durability in Recyclable Polymers Coating

2021 ◽  
Vol 13 (15) ◽  
pp. 8244
Author(s):  
Francesca Cirisano ◽  
Michele Ferrari
Keyword(s):  
Thermal Treatment ◽  
Superhydrophobic Surface ◽  
Low Cost ◽  
Spray Coating ◽  
Large Area ◽  
Average Roughness ◽  
Water Contact ◽  
Alkaline Environments ◽  
Fine Control ◽  
Recycle And Reuse

Highly hydrophobic and superhydrophobic materials obtained from recycled polymers represent an interesting challenge to recycle and reuse advanced performance materials after their first life. In this article, we present a simple and low-cost method to fabricate a superhydrophobic surface by employing polytetrafluoroethylene (PTFE) powder in polystyrene (PS) dispersion. With respect to the literature, the superhydrophobic surface (SHS) was prepared by utilizing a spray- coating technique at room temperature, a glass substrate without any further modification or thermal treatment, and which can be applied onto a large area and on to any type of material with some degree of fine control over the wettability properties. The prepared surface showed superhydrophobic behavior with a water contact angle (CA) of 170°; furthermore, the coating was characterized with different techniques, such as a 3D confocal profilometer, to measure the average roughness of the coating, and scanning electron microscopy (SEM) to characterize the surface morphology. In addition, the durability of SH coating was investigated by a long-water impact test (raining test), thermal treatment at high temperature, an abrasion test, and in acidic and alkaline environments. The present study may suggest an easy and scalable method to produce SHS PS/PTFE films that may find implementation in various fields.

scholarly journals Interaction-tailored organization of large-area colloidal assemblies

2018 ◽  
Vol 9 ◽  
pp. 1582-1593 ◽  
Author(s):  
Silvia Rizzato ◽  
Elisabetta Primiceri ◽  
Anna Grazia Monteduro ◽  
Adriano Colombelli ◽  
Angelo Leo ◽  
...  
Keyword(s):  
Film Formation ◽  
Low Cost ◽  
Interparticle Distance ◽  
Particle Interactions ◽  
Polystyrene Spheres ◽  
Large Area ◽  
Nanoscale Patterning ◽  
Particle Solution ◽  
Number Of Particles ◽  
Deposition Conditions

Colloidal lithography is an innovative fabrication technique employing spherical, nanoscale crystals as a lithographic mask for the low cost realization of nanoscale patterning. The features of the resulting nanostructures are related to the particle size, deposition conditions and interactions involved. In this work, we studied the absorption of polystyrene spheres onto a substrate and discuss the effect of particle–substrate and particle–particle interactions on their organization. Depending on the nature and the strength of the interactions acting in the colloidal film formation, two different strategies were developed in order to control the number of particles on the surface and the interparticle distance, namely changing the salt concentration and absorption time in the particle solution. These approaches enabled the realization of large area (≈cm2) patterning of nanoscale holes (nanoholes) and nanoscale disks (nanodisks) of different sizes and materials.

Patterning Organic Fluorescent Molecules with SAM Patterns

2011 ◽  
Vol 1335 ◽  
Author(s):  
Qiong Wu ◽  
Juanyuan Hao ◽  
Shoulei Shi ◽  
Weifeng Wang ◽  
Nan Lu
Keyword(s):  
Organic Molecules ◽  
Low Cost ◽  
Substrate Surface ◽  
Large Area ◽  
Self Assembled Monolayer ◽  
Storage Duration ◽  
Light Emitting ◽  
High Throughput Method ◽  
Self Assembled ◽  
Fluorescent Molecules

ABSTRACTWe report a low-cost and high-throughput method to fabricate large-area light emitting pattern via thermal evaporation of organic molecules on the patterned self-assembled monolayer of homogenous 3-aminopropyltrimethoxysilane. This method is based on the selective deposition of the organic light emitting molecules on the template of self-assembled monolayer (SAM), which is patterned with nanoimprinting lithography. The selectivity can be controlled by adjusting the design of the pattern, the storage duration and the substrate temperature. The deposition selectivity of the molecules may be caused by the different binding energy of the molecules with the SAM and the substrate surface.

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