Bulk molybdenum field emitters by inductively coupled plasma etching

Ningli Zhu; Matthew T. Cole; William I. Milne; Jing Chen

doi:10.1039/c6cp06340c

Bulk molybdenum field emitters by inductively coupled plasma etching

Physical Chemistry Chemical Physics ◽

10.1039/c6cp06340c ◽

2016 ◽

Vol 18 (48) ◽

pp. 33152-33157 ◽

Cited By ~ 4

Author(s):

Ningli Zhu ◽

Matthew T. Cole ◽

William I. Milne ◽

Jing Chen

Keyword(s):

Plasma Etching ◽

Electron Emission ◽

Inductively Coupled Plasma ◽

Field Electron Emission ◽

Processing Conditions ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled ◽

Field Emitters ◽

Field Electron

Processing conditions are herein explored for the etching of bulk Mo by inductively coupled plasma towards nano tip arrays for field electron emission applications.

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Inductively coupled plasma etching for delineation of InAs/GaSb pixels

10.1117/12.930046 ◽

2012 ◽

Cited By ~ 1

Author(s):

Jean Nguyen ◽

John Gill ◽

Sir B. Rafol ◽

Alexander Soibel ◽

Arezou Khoshakhlagh ◽

...

Keyword(s):

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Comprehensive analysis of field-electron emission properties of nanosized silicon blade-type and needle-type field emitters

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.5068688 ◽

2019 ◽

Vol 37 (2) ◽

pp. 022903 ◽

Cited By ~ 7

Author(s):

Gleb D. Demin ◽

Nikolay A. Djuzhev ◽

Nikolay A. Filippov ◽

Petr Yu. Glagolev ◽

Iliya D. Evsikov ◽

...

Keyword(s):

Electron Emission ◽

Comprehensive Analysis ◽

Field Electron Emission ◽

Emission Properties ◽

Needle Type ◽

Field Emitters ◽

Field Electron

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Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

Journal of Electronic Materials ◽

10.1007/s11664-005-0013-9 ◽

2005 ◽

Vol 34 (6) ◽

pp. 740-745 ◽

Cited By ~ 21

Author(s):

E. Laffosse ◽

J. Baylet ◽

J. P. Chamonal ◽

G. Destefanis ◽

G. Cartry ◽

...

Keyword(s):

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Optimized inductively coupled plasma etching for poly(methyl-methacrylate-glycidly-methacrylate) optical waveguide

Thin Solid Films ◽

10.1016/j.tsf.2012.05.016 ◽

2012 ◽

Vol 520 (18) ◽

pp. 5946-5951 ◽

Cited By ~ 9

Author(s):

Xiaoqiang Sun ◽

Xiaodong Li ◽

Changming Chen ◽

Kun Zhang ◽

Jie Meng ◽

...

Keyword(s):

Methyl Methacrylate ◽

Optical Waveguide ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Poly Methyl Methacrylate ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Low resistivity contacts to plasma etched Mg-doped GaN using very low power inductively coupled plasma etching

Thin Solid Films ◽

10.1016/j.tsf.2011.01.276 ◽

2011 ◽

Vol 519 (11) ◽

pp. 3686-3689 ◽

Cited By ~ 4

Author(s):

A. Baharin ◽

R.S. Pinto ◽

U.K. Mishra ◽

B.D. Nener ◽

G. Parish

Keyword(s):

Low Power ◽

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Low Resistivity ◽

Inductively Coupled ◽

Mg Doped

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Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

Thin Solid Films ◽

10.1016/j.tsf.2009.01.144 ◽

2009 ◽

Vol 517 (14) ◽

pp. 3859-3861 ◽

Cited By ~ 26

Author(s):

Byung-Jae Kim ◽

Hyunjung Jung ◽

Hong-Yeol Kim ◽

Joona Bang ◽

Jihyun Kim

Keyword(s):

Plasma Etching ◽

Inductively Coupled Plasma ◽

Nanosphere Lithography ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching

Chinese Physics Letters ◽

10.1088/0256-307x/32/5/058102 ◽

2015 ◽

Vol 32 (5) ◽

pp. 058102 ◽

Cited By ~ 5

Author(s):

Ying Cheng ◽

Ji-Jun Zou ◽

Ming Wan ◽

Wei-Lu Wang ◽

Xin-Cun Peng ◽

...

Keyword(s):

Plasma Etching ◽

Inductively Coupled Plasma ◽

Factors Affecting ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications

Journal of Applied Physics ◽

10.1063/1.1534908 ◽

2003 ◽

Vol 93 (3) ◽

pp. 1376-1383 ◽

Cited By ~ 60

Author(s):

Liudi Jiang ◽

R. Cheung ◽

R. Brown ◽

A. Mount

Keyword(s):

Plasma Etching ◽

Chemical Bonding ◽

Inductively Coupled Plasma ◽

Surface Chemical ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlN

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581647 ◽

1999 ◽

Vol 17 (3) ◽

pp. 768-773 ◽

Cited By ~ 24

Author(s):

Y. B. Hahn ◽

D. C. Hays ◽

S. M. Donovan ◽

C. R. Abernathy ◽

J. Han ◽

...

Keyword(s):

Plasma Etching ◽

Inductively Coupled Plasma ◽

Noble Gases ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled

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Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas Source

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.06gg07 ◽

2011 ◽

Vol 50 (6) ◽

pp. 06GG07 ◽

Cited By ~ 1

Author(s):

Akihiro Matsutani ◽

Hideo Ohtsuki ◽

Fumio Koyama

Keyword(s):

Plasma Etching ◽

Inductively Coupled Plasma ◽

Inductively Coupled Plasma Etching ◽

Inductively Coupled ◽

Gas Source

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