Surface chemistry of copper metal and copper oxide atomic layer deposition from copper(ii) acetylacetonate: a combined first-principles and reactive molecular dynamics study
2015 ◽
Vol 17
(40)
◽
pp. 26892-26902
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Keyword(s):
Atomistic mechanisms for the atomic layer deposition using the Cu(acac)2 (acac = acetylacetonate) precursor are studied using first-principles calculations and reactive molecular dynamics simulations.
Keyword(s):
2018 ◽
Vol 141
(1)
◽
pp. 414-422
◽
2019 ◽
Vol 35
(7)
◽
pp. 720-731
◽
Keyword(s):
2019 ◽
Vol 04
(02)
◽
pp. 1950002
◽
2005 ◽
Vol 23
(1)
◽
pp. 118-125
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Keyword(s):
2016 ◽
Vol 389
◽
pp. 316-323
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2017 ◽
Vol 121
(49)
◽
pp. 27379-27388
◽
2017 ◽
Vol 29
(11)
◽
pp. 4654-4666
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Keyword(s):