Nitridation effect of the α-Al2O3 substrates on the quality of the GaN films grown by pulsed laser deposition
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High-quality GaN films with sharp and abrupt interfaces have been achieved on nitrided α-Al2O3 substrates by pulsed laser deposition. The effect of nitridation on the properties and the growth mechanism of GaN films have been carefully studied.
1997 ◽
Vol 299
(1-2)
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pp. 94-103
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2001 ◽
Vol 388
(1-2)
◽
pp. 189-194
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2001 ◽
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