Macroscopic high density nanodisc arrays of zinc oxide fabricated by block copolymer self-assembly assisted nanoimprint lithography

2012 ◽  
Vol 22 (41) ◽  
pp. 21871 ◽  
Author(s):  
Vignesh Suresh ◽  
Meiyu Stella Huang ◽  
M. P. Srinivasan ◽  
Sivashankar Krishnamoorthy
Keyword(s):  
Zinc Oxide ◽  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
High Density

Resistive Switching in High-Density Nanodevices Fabricated by Block Copolymer Self-Assembly

ACS Nano ◽  
2015 ◽  
Vol 9 (3) ◽  
pp. 2518-2529 ◽  
Author(s):  
Jacopo Frascaroli ◽  
Stefano Brivio ◽  
Federico Ferrarese Lupi ◽  
Gabriele Seguini ◽  
Luca Boarino ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Resistive Switching ◽  
Self Assembly ◽  
High Density

Robust, High-Density Zinc Oxide Nanoarrays by Nanoimprint Lithography-Assisted Area-Selective Atomic Layer Deposition

2012 ◽  
Vol 116 (44) ◽  
pp. 23729-23734 ◽  
Author(s):  
Vignesh Suresh ◽  
Meiyu Stella Huang ◽  
M. P. Srinivasan ◽  
Cao Guan ◽  
Hong Jin Fan ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Atomic Layer Deposition ◽  
Nanoimprint Lithography ◽  
Atomic Layer ◽  
High Density ◽  
Layer Deposition

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

2012 ◽  
Vol 11 (3) ◽  
pp. 031405-1 ◽  
Author(s):  
Lei Wan ◽  
Ricardo Ruiz ◽  
He Gao ◽  
Kanaiyalal C. Patel ◽  
Jeffrey Lille ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography

High density array of CdS nanoporous films on ITO from self-assembly of block copolymer

2014 ◽  
Vol 303 ◽  
pp. 433-437
Author(s):  
Yumei Gong ◽  
Yingxin He ◽  
Jingchuan Song ◽  
Ying Liu ◽  
Jing Guo ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
High Density ◽  
Nanoporous Films

Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media

2014 ◽  
Vol 25 (39) ◽  
pp. 395301 ◽  
Author(s):  
XiaoMin Yang ◽  
Shuaigang Xiao ◽  
Wei Hu ◽  
Justin Hwu ◽  
René van de Veerdonk ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
20 Nm

Porous metallic nanocone arrays for high-density SERS hot spots via solvent-assisted nanoimprint lithography of block copolymer

RSC Advances ◽  
2015 ◽  
Vol 5 (93) ◽  
pp. 76085-76091 ◽  
Author(s):  
Yunha Ryu ◽  
Gumin Kang ◽  
Chang-Won Lee ◽  
Kyoungsik Kim
Keyword(s):  
Block Copolymer ◽  
Hot Spots ◽  
Nanoimprint Lithography ◽  
Selective Etching ◽  
High Density ◽  
Sers Substrate

We present a facile method of fabricating SERS substrate by combining solvent-assisted nanoimprint lithography and selective etching of block copolymer.

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