scholarly journals Corrigendum: A facile route to regular and non-regular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly

2014 ◽  
Vol 52 (11) ◽  
pp. 789-789
Author(s):  
Shuaigang Xiao ◽  
XiaoMin Yang ◽  
Justin J. Hwu ◽  
Kim Y. Lee ◽  
David Kuo
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
Facile Route

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

2012 ◽  
Vol 11 (3) ◽  
pp. 031405-1 ◽  
Author(s):  
Lei Wan ◽  
Ricardo Ruiz ◽  
He Gao ◽  
Kanaiyalal C. Patel ◽  
Jeffrey Lille ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography

Macroscopic high density nanodisc arrays of zinc oxide fabricated by block copolymer self-assembly assisted nanoimprint lithography

2012 ◽  
Vol 22 (41) ◽  
pp. 21871 ◽  
Author(s):  
Vignesh Suresh ◽  
Meiyu Stella Huang ◽  
M. P. Srinivasan ◽  
Sivashankar Krishnamoorthy
Keyword(s):  
Zinc Oxide ◽  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
High Density

Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media

2014 ◽  
Vol 25 (39) ◽  
pp. 395301 ◽  
Author(s):  
XiaoMin Yang ◽  
Shuaigang Xiao ◽  
Wei Hu ◽  
Justin Hwu ◽  
René van de Veerdonk ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Nanoimprint Lithography ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
20 Nm

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Oxidation and ATP dual-responsive block copolymer containing tertiary sulfoniums: self-assembly, protein complexation and triggered release

2021 ◽  
Author(s):  
Yanfen Jiang ◽  
Shuqi Dong ◽  
Guoyang Qin ◽  
Li Liu ◽  
Hanying Zhao
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Phenylboronic Acid ◽  
Cationic Polymer ◽  
Release Profile ◽  
Triggered Release ◽  
Dual Responsive ◽  
Protein Complexation

Alkylation of thioether-containing block copolymer simultaneously incorporated sulfoniums and phenylboronic acid moieties. The co-assembly of this cationic polymer and protein generated micelles with an H2O2-and ATP-responsive release profile.

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