Effect of hydration of the TiO2 anatase (101) substrate on the atomic layer deposition of alumina films

2011 ◽  
Vol 21 (12) ◽  
pp. 4197 ◽  
Author(s):  
U. Terranova ◽  
D. R. Bowler
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Anatase ◽  
Alumina Films ◽  
Layer Deposition

Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources

2017 ◽  
Vol 35 (1) ◽  
pp. 01B117 ◽  
Author(s):  
Sebastian Franke ◽  
Matthias Baumkötter ◽  
Carsten Monka ◽  
Sebastian Raabe ◽  
Reinhard Caspary ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Gas Barrier ◽  
Barrier Layers ◽  
Alumina Films ◽  
Layer Deposition

Study of the Effect of Laser Radiation on the Parameters of Alumina Films Formed by Atomic Layer Deposition

2018 ◽  
Vol 13 (9-10) ◽  
pp. 502-507
Author(s):  
A. A. Dedkova ◽  
N. A. Dyuzhev ◽  
V. Yu. Kireev ◽  
I. E. Klemente ◽  
A. V. Myakon’kikh ◽  
...  
Keyword(s):  
Laser Radiation ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Alumina Films ◽  
Layer Deposition

TiO2 anatase films obtained by direct liquid injection atomic layer deposition at low temperature

2014 ◽  
Vol 288 ◽  
pp. 201-207 ◽  
Author(s):  
L. Avril ◽  
S. Reymond-Laruinaz ◽  
J.M. Decams ◽  
S. Bruyère ◽  
V. Potin ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Anatase ◽  
Layer Deposition ◽  
Liquid Injection ◽  
Direct Liquid Injection

Thermo-mechanical properties of alumina films created using the atomic layer deposition technique

2010 ◽  
Vol 164 (1-2) ◽  
pp. 58-67 ◽  
Author(s):  
David C. Miller ◽  
Ross R. Foster ◽  
Shih-Hui Jen ◽  
Jacob A. Bertrand ◽  
Shawn J. Cunningham ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Technique ◽  
Alumina Films ◽  
Layer Deposition ◽  
Atomic Layer Deposition Technique

scholarly journals Tunable Plasmonic Colours by Atomic Layer Deposition of Alumina

2018 ◽  
Author(s):  
Jean-Michel Guay ◽  
Antonio Calà Lesina ◽  
Graham Killaire ◽  
Peter Gordon ◽  
Choloong Hahn ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Film Thickness ◽  
Time Domain ◽  
Finite Difference Time Domain ◽  
Color Space ◽  
Atomic Layer ◽  
Alumina Film ◽  
Alumina Films ◽  
Layer Deposition ◽  
Difference Time

We report the tuning of plasmonic colours on silver by controlling the thickness of alumina films deposited via atomic layer deposition. The colours are observed to shift with increasing alumina film thickness. Colour palettes produced with periodic topographical features are observed to recover their original vibrancy and Hue range after the deposition of a film thickness of ~ 60 nm while colours devoid of such topographical features are observed to gradually fade and their colour intensities are never recovered collapsing into a small visually unappealing region of the LCH color space. Analysis of the surfaces identifies the periodic topographical features as responsible for this behavior. Finite-difference time-domain simulations of flat and sine-modulated surfaces covered with nanoparticles and covered by a conformal alumina film were conducted to unravel the role played by the ALD thickness on the colour formation, where colour rotations and recovery were also observed. The coloured surfaces were evaluated for applications in colourimetric and radiometric sensing showing large sensitivities of up to 3.06/nm and 3.19 nm/nm, respectively. The colourimetric and radiometric sensitivities are ob-served to be colour dependent.

scholarly journals Mesoporous TiO2 anatase films for enhanced photocatalytic activity under UV and visible light

RSC Advances ◽  
2020 ◽  
Vol 10 (63) ◽  
pp. 38233-38243
Author(s):  
Olga M. Ishchenko ◽  
Guillaume Lamblin ◽  
Jérôme Guillot ◽  
Ingrid C. Infante ◽  
Maël Guennou ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Atomic Layer Deposition ◽  
Visible Light ◽  
Room Temperature ◽  
Atomic Layer ◽  
Mesoporous Tio2 ◽  
Tio2 Anatase ◽  
Visible Wavelength ◽  
Layer Deposition

Mesoporous TiO2 films with enhanced photocatalytic activity in both UV and visible wavelength ranges were developed through a non-conventional atomic layer deposition (ALD) process at room temperature.

Tunable Plasmonic Colours by Atomic Layer Deposition of Alumina

2018 ◽  
Author(s):  
Jean-Michel Guay ◽  
Antonio Calà Lesina ◽  
Graham Killaire ◽  
Peter Gordon ◽  
Choloong Hahn ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Film Thickness ◽  
Time Domain ◽  
Finite Difference Time Domain ◽  
Color Space ◽  
Atomic Layer ◽  
Alumina Film ◽  
Alumina Films ◽  
Layer Deposition ◽  
Difference Time

We report the tuning of plasmonic colours on silver by controlling the thickness of alumina films deposited via atomic layer deposition. The colours are observed to shift with increasing alumina film thickness. Colour palettes produced with periodic topographical features are observed to recover their original vibrancy and Hue range after the deposition of a film thickness of ~ 60 nm while colours devoid of such topographical features are observed to gradually fade and their colour intensities are never recovered collapsing into a small visually unappealing region of the LCH color space. Analysis of the surfaces identifies the periodic topographical features as responsible for this behavior. Finite-difference time-domain simulations of flat and sine-modulated surfaces covered with nanoparticles and covered by a conformal alumina film were conducted to unravel the role played by the ALD thickness on the colour formation, where colour rotations and recovery were also observed. The coloured surfaces were evaluated for applications in colourimetric and radiometric sensing showing large sensitivities of up to 3.06/nm and 3.19 nm/nm, respectively. The colourimetric and radiometric sensitivities are ob-served to be colour dependent.

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