Low-temperature, simple and fast integration technique of microfluidic chips by using a UV-curable adhesive

Lab on a Chip ◽  
2010 ◽  
Vol 10 (16) ◽  
pp. 2115 ◽  
Author(s):  
Rerngchai Arayanarakool ◽  
Séverine Le Gac ◽  
Albert van den Berg
2006 ◽  
Vol 510-511 ◽  
pp. 446-449 ◽  
Author(s):  
Ki Yeon Yang ◽  
Sung Hoon Hong ◽  
Heon Lee ◽  
Jeong Woo Choi

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.


2012 ◽  
Vol 12 (6) ◽  
pp. 1596-1599 ◽  
Author(s):  
Il Doh ◽  
Sechan Youn ◽  
Young-Hyun Jin ◽  
Young-Ho Cho

2005 ◽  
Vol 38 (7) ◽  
pp. 1127-1136 ◽  
Author(s):  
Jianhua Li ◽  
Di Chen ◽  
Gang Chen

1999 ◽  
Vol 30 (1) ◽  
pp. 848 ◽  
Author(s):  
J. Baumbach ◽  
H. Baur ◽  
E. Lueder ◽  
A. Yamauchi ◽  
L. Dorfmueller ◽  
...  

1984 ◽  
Vol 20 (21) ◽  
pp. 879
Author(s):  
H. Itoh ◽  
T. Kimura ◽  
S. Yamakawa

2007 ◽  
Vol 17 (6) ◽  
pp. 1147-1153 ◽  
Author(s):  
Young-Hyun Jin ◽  
Young-Ho Cho ◽  
Lars E Schmidt ◽  
Yves Leterrier ◽  
Jan-Anders E Månson

2010 ◽  
Vol 16 (4) ◽  
pp. 533-541 ◽  
Author(s):  
Zongbo Zhang ◽  
Yi Luo ◽  
Xiaodong Wang ◽  
Yingsong Zheng ◽  
Yanguo Zhang ◽  
...  

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