High Throughput, Low Temperature COG Bonding using Printed UV Curable ACA

1999 ◽  
Vol 30 (1) ◽  
pp. 848 ◽  
Author(s):  
J. Baumbach ◽  
H. Baur ◽  
E. Lueder ◽  
A. Yamauchi ◽  
L. Dorfmueller ◽  
...  
Materials ◽  
2020 ◽  
Vol 13 (8) ◽  
pp. 1869 ◽  
Author(s):  
Katherine McCullough ◽  
Pei-Hua Chiang ◽  
Juan D. Jimenez ◽  
Jochen A. Lauterbach

High throughput experimentation has the capability to generate massive, multidimensional datasets, allowing for the discovery of novel catalytic materials. Here, we show the synthesis and catalytic screening of over 100 unique Ru-Metal-K based bimetallic catalysts for low temperature ammonia decomposition, with a Ru loading between 1–3 wt% Ru and a fixed K loading of 12 wt% K, supported on γ-Al2O3. Bimetallic catalysts containing Sc, Sr, Hf, Y, Mg, Zr, Ta, or Ca in addition to Ru were found to have excellent ammonia decomposition activity when compared to state-of-the-art catalysts in literature. Furthermore, the Ru content could be reduced to 1 wt% Ru, a factor of four decrease, with the addition of Sr, Y, Zr, or Hf, where these secondary metals have not been previously explored for ammonia decomposition. The bimetallic interactions between Ru and the secondary metal, specifically RuSrK and RuFeK, were investigated in detail to elucidate the reaction kinetics and surface properties of both high and low performing catalysts. The RuSrK catalyst had a turnover frequency of 1.78 s−1, while RuFeK had a turnover frequency of only 0.28 s−1 under identical operating conditions. Based on their apparent activation energies and number of surface sites, the RuSrK had a factor of two lower activation energy than the RuFeK, while also possessing an equivalent number of surface sites, which suggests that the Sr promotes ammonia decomposition in the presence of Ru by modifying the active sites of Ru.


2006 ◽  
Vol 252 (7) ◽  
pp. 2615-2621 ◽  
Author(s):  
Sohei Okazaki ◽  
Noriaki Okazaki ◽  
Xiaoru Zhao ◽  
Hidetaka Sugaya ◽  
Sei-ichiro Yaginuma ◽  
...  

2006 ◽  
Vol 510-511 ◽  
pp. 446-449 ◽  
Author(s):  
Ki Yeon Yang ◽  
Sung Hoon Hong ◽  
Heon Lee ◽  
Jeong Woo Choi

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.


2019 ◽  
Vol 7 (9) ◽  
pp. 2583-2588 ◽  
Author(s):  
Takuya Shinohara ◽  
Seiji Obata ◽  
Koichiro Saiki

Graphene, a honeycomb network of sp2 carbon atoms, is expected to replace conventional materials in various fields, which makes it important to develop a high-throughput graphene synthesis method for industrial applications.


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