Low-temperature excess loss of UV-curable acrylate/nylon-coated optical fibres

1984 ◽  
Vol 20 (21) ◽  
pp. 879
Author(s):  
H. Itoh ◽  
T. Kimura ◽  
S. Yamakawa
1982 ◽  
Vol 21 (23) ◽  
pp. 4300 ◽  
Author(s):  
Steinar Stueflotten

2006 ◽  
Vol 510-511 ◽  
pp. 446-449 ◽  
Author(s):  
Ki Yeon Yang ◽  
Sung Hoon Hong ◽  
Heon Lee ◽  
Jeong Woo Choi

UV nano imprint lithography (UV NIL) that uses a monomer based UV curable monomer resin is proposed as a method of imprinting at low temperature and pressure. The fabrication of high fidelity patterns on a topographical substrate is a formidable challenge. To accomplish this, the use of bi-layer nano imprint lithography, which involves the use of an easily removable under-layer and an imprinted pattern, is proposed. We hypothesized that by etching the under layer by oxygen RIE, we might be able to build the bi-layer patterns for easy lift-off and fabricate nano-sized metal patterns through this lift-off process.


2012 ◽  
Vol 12 (6) ◽  
pp. 1596-1599 ◽  
Author(s):  
Il Doh ◽  
Sechan Youn ◽  
Young-Hyun Jin ◽  
Young-Ho Cho

2014 ◽  
Vol 4 (1) ◽  
Author(s):  
Kensaku Nakamura ◽  
Yoshihiro Takahashi ◽  
Takumi Fujiwara

2011 ◽  
Vol 514 (1-3) ◽  
pp. 62-65
Author(s):  
F. Schröder ◽  
B. Winkler ◽  
J.D. Bauer ◽  
E. Haussühl ◽  
B. Rivera Escoto ◽  
...  

Lab on a Chip ◽  
2010 ◽  
Vol 10 (16) ◽  
pp. 2115 ◽  
Author(s):  
Rerngchai Arayanarakool ◽  
Séverine Le Gac ◽  
Albert van den Berg

1984 ◽  
Vol 20 (7) ◽  
pp. 304 ◽  
Author(s):  
U.C. Paek ◽  
C.M. Schroeder
Keyword(s):  

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