scholarly journals Gas phase controlled deposition of high quality large-area graphene films

2010 ◽  
Vol 46 (9) ◽  
pp. 1422 ◽  
Author(s):  
Shishir Kumar ◽  
Niall McEvoy ◽  
Tarek Lutz ◽  
Gareth P. Keeley ◽  
Valeria Nicolosi ◽  
...  
Science ◽  
2009 ◽  
Vol 324 (5932) ◽  
pp. 1312-1314 ◽  
Author(s):  
X. Li ◽  
W. Cai ◽  
J. An ◽  
S. Kim ◽  
J. Nah ◽  
...  

MRS Advances ◽  
2017 ◽  
Vol 2 (60) ◽  
pp. 3749-3754
Author(s):  
Maria Kim ◽  
Changfeng Li ◽  
Jannatul Susoma ◽  
Juha Riikonen ◽  
Harri Lipsanen

ABSTRACTNext-generation electronic devices are expected to demonstrate greater utility, efficiency and durability. Meanwhile, plastics such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN) and variety of poly(para-xylylene) polymers enable transformational advantages to device shape, flexibility, weight, transparency and recyclability. Exhibiting a combination of outstanding mechanical, electrical, optical, and chemical properties of graphene with the plastic substrates could propose ideal material for the future flexible electronics. Chemical vapor deposition (CVD) allows cost-effective fabrication of a high-quality large-area graphene films, however, the critical issue is clean and noninvasive transfer of the films onto a desired substrate. The water-based delamination of CVD grown graphene on Cu can be considered as a “green” transfer process utilizing only hot deionized water. We investigated a method requiring only two essential steps: coating of 6-inch monolayer CVD graphene with transparent and flexible polymer, and Cu delamination in hot water. Proposed method is inexpensive, reproducible, environmentally friendly, waste-free and suitable for large-scale, high quality graphene. The transfer process demonstrated films with enhanced charge carrier mobility, high uniformity, free of mechanical defects, and sheet resistance as low as ∼50 Ω/sq with 96.5 % transparency at 550 nm wavelength.


2018 ◽  
Vol 6 (45) ◽  
pp. 22437-22464 ◽  
Author(s):  
Afzal Khan ◽  
Mohammad Rezwan Habib ◽  
Rishi Ranjan Kumar ◽  
Sk Masiul Islam ◽  
V. Arivazhagan ◽  
...  

Metal-catalyzed chemical vapor deposition (CVD) growth of graphene is one of the most important techniques to produce high quality and large area graphene films.


Nanoscale ◽  
2016 ◽  
Vol 8 (21) ◽  
pp. 11241-11247 ◽  
Author(s):  
I. Pasternak ◽  
P. Dabrowski ◽  
P. Ciepielewski ◽  
V. Kolkovsky ◽  
Z. Klusek ◽  
...  

Various experimental data revealing large-area high-quality graphene films grown by the CVD method on Ge(001)/Si(001) substrates are presented.


2015 ◽  
Vol 3 (32) ◽  
pp. 8364-8371 ◽  
Author(s):  
T. S. Tripathi ◽  
Janne-Petteri Niemelä ◽  
Maarit Karppinen

Atomic layer deposition (ALD) is a vital gas-phase technique for atomic-level thickness-controlled deposition of high-quality thin films of CuCrO2 on various substrate morphologies owing to its self-limiting gas-surface reaction mechanism.


Carbon ◽  
2013 ◽  
Vol 56 ◽  
pp. 271-278 ◽  
Author(s):  
Xu-Dong Chen ◽  
Zhi-Bo Liu ◽  
Chao-Yi Zheng ◽  
Fei Xing ◽  
Xiao-Qing Yan ◽  
...  

2005 ◽  
Vol 16 (10) ◽  
pp. 2072-2076 ◽  
Author(s):  
Fu Zhou ◽  
Huagui Zheng ◽  
Xuemei Zhao ◽  
Qixun Guo ◽  
Xiaomin Ni ◽  
...  

2012 ◽  
Vol 101 (26) ◽  
pp. 263101 ◽  
Author(s):  
Nima Rouhi ◽  
Yung Yu Wang ◽  
Peter J. Burke

1992 ◽  
Vol 61 (3) ◽  
pp. 348-350 ◽  
Author(s):  
Y. Z. Zhang ◽  
L. Li ◽  
Y. Y. Zhao ◽  
B. R. Zhao ◽  
J. W. Li ◽  
...  

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