scholarly journals Surface Termination Conversion during SrTiO3 Thin Film Growth Revealed by X-ray Photoelectron Spectroscopy

2015 ◽  
Vol 5 (1) ◽  
Author(s):  
Christoph Baeumer ◽  
Chencheng Xu ◽  
Felix Gunkel ◽  
Nicolas Raab ◽  
Ronja Anika Heinen ◽  
...  
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Film Growth ◽  
Thin Film Growth ◽  
X Ray ◽  
Surface Termination

Combinatorial (Ba,Sr)TiO3 thin film growth: X-ray diffraction and Raman spectroscopy

2009 ◽  
Vol 106 (3) ◽  
pp. 034108 ◽  
Author(s):  
H. Bouyanfif ◽  
J. Wolfman ◽  
M. El Marssi ◽  
Y. Yuzyuk ◽  
R. Bodeux ◽  
...  
Keyword(s):  
Thin Film ◽  
Raman Spectroscopy ◽  
Film Growth ◽  
Thin Film Growth ◽  
Tio3 Thin Film ◽  
X Ray Diffraction ◽  
X Ray

Soft x-ray spectrometer for in situ monitoring of thin-film growth

1994 ◽  
Author(s):  
Per Skytt ◽  
Carl J. Englund ◽  
Nial Wassdahl ◽  
Derrick C. Mancini ◽  
Joseph Nordgren
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Thin Film Growth ◽  
In Situ Monitoring ◽  
X Ray

X-ray diffraction analysis of YBaCuO ultra-thin film growth

1997 ◽  
Vol 251 (1-2) ◽  
pp. 65-69 ◽  
Author(s):  
G. Linker ◽  
D. Hüttner ◽  
O. Meyer ◽  
M. Ohkubo ◽  
J. Reiner
Keyword(s):  
Thin Film ◽  
Diffraction Analysis ◽  
Film Growth ◽  
Thin Film Growth ◽  
X Ray Diffraction ◽  
X Ray ◽  
Ultra Thin Film

Photoinduced Selective Deposition of Aluminium Thin Film Using Dimethylaluminum Hydride

1991 ◽  
Vol 236 ◽  
Author(s):  
Mitsugu Hanabusa ◽  
Hideki Ouchi ◽  
Kenji Ishida ◽  
Masahiro Kawasaki ◽  
Satoshi Shogen
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Surface Reaction ◽  
Silicon Oxide ◽  
Film Growth ◽  
X Ray ◽  
Etched Silicon ◽  
Substrate Surfaces ◽  
Deuterium Lamp ◽  
Dimethylaluminum Hydride

AbstractAluminum thin film was deposited via a photochemical surface reaction of dimethylaluminum hydride (DMAH) using a deuterium lamp. The period required to initiate the film growth differed with substrate, and making use of this result the film could be grown preferentially on silicon nitride and silicon oxide layers rather than on wet-etched silicon. On the basis of an x-ray photoelectron spectroscopy the observed dependence of photodeposition on substrate surfaces can be attributed to how DMAH is chemisorbed initially.

In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition

2011 ◽  
Vol 11 (2) ◽  
pp. 1577-1580 ◽  
Author(s):  
Yong Jun Park ◽  
Dong Ryeol Lee ◽  
Hyun Hwi Lee ◽  
Han-Bo-Ram Lee ◽  
Hyungjun Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
X Ray ◽  
X Ray Scattering ◽  
Layer Deposition ◽  
Scattering Study
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