scholarly journals Elastically relaxed free-standing strained-silicon nanomembranes

2006 ◽  
Vol 5 (5) ◽  
pp. 388-393 ◽  
Author(s):  
Michelle M. Roberts ◽  
Levente J. Klein ◽  
Donald E. Savage ◽  
Keith A. Slinker ◽  
Mark Friesen ◽  
...  
2013 ◽  
Vol 3 (1) ◽  
Author(s):  
Han Zhou ◽  
Jung-Hun Seo ◽  
Deborah M. Paskiewicz ◽  
Ye Zhu ◽  
George K. Celler ◽  
...  

MRS Bulletin ◽  
2007 ◽  
Vol 32 (1) ◽  
pp. 57-63 ◽  
Author(s):  
Max G. Lagally

AbstractThis article is based on the presentation given by Max G. Lagally (University of Wisconsin–Madison) as part of Symposium X: Frontiers of Materials Research on April 18, 2006, at the Materials Research Society Spring Meeting in San Francisco.Structures with nanoscale dimensions are the essence of nanotechnology. Beginning with quantum dots and buckyballs, nanostructures now include nanotubes, rods, wires, and most recently, nanomembranes: very thin, large, freestanding or freefloating strain-engineered single crystals that can variously be made into tubes or other shapes, cut into millions of identical wires, or used as conformal sheets. This article provides a brief overview of the fabrication and properties of strained-silicon nanomembranes.


2014 ◽  
Vol 105 (19) ◽  
pp. 193505 ◽  
Author(s):  
Gaodi Sun ◽  
Miao Zhang ◽  
Zhongying Xue ◽  
Qinglei Guo ◽  
Da Chen ◽  
...  

2008 ◽  
Vol 101 (14) ◽  
Author(s):  
C. Euaruksakul ◽  
Z. W. Li ◽  
F. Zheng ◽  
F. J. Himpsel ◽  
C. S. Ritz ◽  
...  

2010 ◽  
Vol 12 (10) ◽  
pp. 103011 ◽  
Author(s):  
C S Ritz ◽  
H-J Kim-Lee ◽  
D M Detert ◽  
M M Kelly ◽  
F S Flack ◽  
...  

2015 ◽  
Vol 24 (3) ◽  
pp. 036801
Author(s):  
Gao-Di Sun ◽  
Lin-Xi Dong ◽  
Zhong-Ying Xue ◽  
Da Chen ◽  
Qing-Lei Guo ◽  
...  

2003 ◽  
Vol 765 ◽  
Author(s):  
Minjoo L. Lee ◽  
Eugene A. Fitzgerald

AbstractThe use of alternative channel materials such as germanium [1,2] and strained silicon (ε-Si) [3-5] is increasingly being considered as a method for improving the performance of MOSFETs. While ε-Si grown on relaxed Si1-x Gex is drawing closer to widespread commercialization, it is currently believed that almost all of the performance benefit in CMOS implementations will derive from the enhanced mobility of the n -MOSFET [5]. In this paper, we demonstrate that ε-Si p -MOSFETs can be engineered to exhibit mobility enhancements that increase or remain constant as a function of inversion density. We have also designed and fabricated ε-Si / ε-Ge dual-channel p -MOSFETs exhibiting mobility enhancements of 10 times. These p -MOSFETs can be integrated on the same wafers as ε-Si n -MOSFETs, making symmetric-mobility CMOS possible.


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