Neutrality Conditions for Block Copolymer Systems on Random Copolymer Brush Surfaces

1999 ◽  
Vol 32 (16) ◽  
pp. 5299-5303 ◽  
Author(s):  
E. Huang ◽  
S. Pruzinsky ◽  
T. P. Russell ◽  
J. Mays ◽  
C. J. Hawker
Keyword(s):  
Block Copolymer ◽  
Random Copolymer ◽  
Copolymer Brush

Crossover of a block copolymer brush in a polymer melt from a stretched to collapsed conformation

1997 ◽  
Vol 56 (3) ◽  
pp. R2383-R2386 ◽  
Author(s):  
Robert Oslanec ◽  
Petr Vlcek ◽  
William A. Hamilton ◽  
Russell J. Composto
Keyword(s):  
Block Copolymer ◽  
Polymer Melt ◽  
Copolymer Brush

Fluorocarbon-Free Dual-Action Textile Finishes Based on Covalently Attached Thermoresponsive Block Copolymer Brush Coatings

2018 ◽  
Vol 10 (46) ◽  
pp. 40088-40099 ◽  
Author(s):  
Martin Messerschmidt ◽  
Andreas Janke ◽  
Frank Simon ◽  
Christian Hanzelmann ◽  
Tino Riske ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Dual Action ◽  
Copolymer Brush

Development of Strategies to Improvement Ordering and Perpendicular Alignment of Cylinder Phase Block Copolymers Used as Templates for Bit Patterned Media

2007 ◽  
Vol 1032 ◽  
Author(s):  
Seth Garrett ◽  
Vincent Franco ◽  
Timothy Snowden ◽  
Chris Redden ◽  
Vishal Warke ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Substrate Surface ◽  
Chemical Properties ◽  
Random Copolymer ◽  
Pattern Generation ◽  
Information Storage ◽  
Bit Patterned Media ◽  
Patterned Media ◽  
The Individual

AbstractBit patterned media, including media fabricated with a gradient in composition, is being developed as a potential path to higher information storage density. The noise level in such media is significantly impacted by the precision of the ordering of the individual bits and by the narrowness of their size distribution. Block copolymers that phase separate on the appropriate length scale are one method of pattern generation that is receiving considerable attention. For cylinder forming block copolymer phases the ordering and degree of perpendicular alignment is largely determined by the matching of the substrate surface to the block copolymer. If the chemical properties of the substrate surface match the average for the block copolymer, then thin films of the block copolymer align perpendicularly on annealing. Although there are a number of examples where the substrate surface fortuitously matches the block copolymer, in general an orienting layer is necessary to provide the appropriate match. The most popular approach has been to synthesize a random copolymer with the same average composition as the block copolymer. In order to produce suitably thin orienting layers it has been necessary to chemically tether the random copolymer to the substrate. Previously used chemistry has not been suitable for noble metal substrates such as platinum. We have been developing an alternate approach using thiol functional groups which we anticipate will be more suitable for Pt capped substrates.

Toughened polypropylene random copolymer with olefin block copolymer

2016 ◽  
Vol 107 ◽  
pp. 295-301 ◽  
Author(s):  
Qilin Ren ◽  
Jiashu Fan ◽  
Qinglong Zhang ◽  
Jianjun Yi ◽  
Jiachun Feng
Keyword(s):  
Block Copolymer ◽  
Random Copolymer ◽  
Polypropylene Random Copolymer

Self-Assembled Nanostructures of Block Copolymers on Random Copolymer Brush

2007 ◽  
Vol 124-126 ◽  
pp. 579-582
Author(s):  
Bong Hoon Kim ◽  
Chong Min Koo ◽  
Seong Jun Jeong ◽  
Dong Ok Shin ◽  
Sang Ouk Kim
Keyword(s):  
Free Radical ◽  
Polymer Brushes ◽  
Silicon Oxide ◽  
Random Copolymer ◽  
Hydroxyl Group ◽  
Silicon Oxide Layer ◽  
Molecular Weights ◽  
A Chain ◽  
Copolymer Brush ◽  
End Group

We synthesized the polymer brushes by conventional free radical polymerization and investigated the morphology evolution of block copolymer nanostructure on the brush treated surfaces. Our simple approach utilized a functionalized free radical initiator to add hydroxyl group to a chain end and an excess amount of a chain transfer agent to control the molecular weights of the brushes. The synthesized polymer brushes had narrow molecular weight distribution as well as hydroxyl end group and were successfully grafted onto silicon oxide layer by simple spin-coating and annealing process. The orientation of poly(styrene-block-methyl methacrylate)s (PS-b- PMMAs) coated on the brush grafted surface was finely controlled by the surface modification by polymer brushes.

Ultrathin Random Copolymer-Grafted Layers for Block Copolymer Self-Assembly

2015 ◽  
Vol 7 (20) ◽  
pp. 10944-10951 ◽  
Author(s):  
Katia Sparnacci ◽  
Diego Antonioli ◽  
Valentina Gianotti ◽  
Michele Laus ◽  
Federico Ferrarese Lupi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Random Copolymer
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