Ultrathin Random Copolymer-Grafted Layers for Block Copolymer Self-Assembly

2015 ◽  
Vol 7 (20) ◽  
pp. 10944-10951 ◽  
Author(s):  
Katia Sparnacci ◽  
Diego Antonioli ◽  
Valentina Gianotti ◽  
Michele Laus ◽  
Federico Ferrarese Lupi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Random Copolymer

A Concise Route to Fabricate TiO2 Nanoporous and Nanopillar Films Based on Block Copolymer Self-Assembly

2013 ◽  
Vol 774-776 ◽  
pp. 931-934 ◽  
Author(s):  
Yu Mei Gong ◽  
Ying Xin He ◽  
Jing Guo ◽  
Hong Zhang
Keyword(s):  
Acetic Acid ◽  
Block Copolymer ◽  
Titanium Oxide ◽  
Self Assembly ◽  
Random Copolymer ◽  
The Self ◽  
Nanoparticle Arrays ◽  
Cylindrical Domains ◽  
Ordered Array

This study developed a concise route to fabricate TiO2 nanoporous and nanopillar films based on the self-assembly of block-copolymer thin films in periodic nanostructures. We obtained the perpendicularly oriented cylindrical domains in polystyrene-b-poly (methyl methacrylate) (PS-b-PMMA) diblock copolymer (BCP) films by thermal annealing on ITO substrate modified by a cross-linkable random copolymer, and then these films were immersed into the titanium oxide sol in acetic acid for a few hours. The acetic acid in the sol can selectively swell the PMMA component, which results in titanium oxide sol being loaded to the PMMA component selectively. Then the films were calcined at high temperature to remove the PS-b-PMMA block copolymer, and simultaneously the titanium oxide was transferred in situ to the substrate. As a result, a highly ordered array of nanoporous and nanopillar TiO2 thin film is observed on the ITO substrates depending upon the block copolymer used with PS and PMMA cylinder-forming components. In principle, it can be a general and versatile approach for fabricating functional nanoparticle arrays.

Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes

Soft Matter ◽  
2015 ◽  
Vol 11 (47) ◽  
pp. 9107-9114 ◽  
Author(s):  
Gunja Pandav ◽  
William J. Durand ◽  
Christopher J. Ellison ◽  
C. Grant Willson ◽  
Venkat Ganesan
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Film Thickness ◽  
Self Assembly ◽  
Interaction Strength ◽  
Random Copolymer ◽  
Copolymer Film ◽  
Pattern Size ◽  
Copolymer Brushes

Directed self-assembly of block copolymers on chemical patterns with sidewall guiding lines is examined as a function of backfill brush properties, block copolymer film thickness, pattern size, and sidewall interaction strength.

Effect of chain microstructure on self-assembly and emulsification of amphiphilic poly(acrylic acid)-polystyrene copolymers

2016 ◽  
Vol 18 (37) ◽  
pp. 26236-26244 ◽  
Author(s):  
Ye Zhu ◽  
Chenglin Yi ◽  
Qiong Hu ◽  
Wei Wei ◽  
Xiaoya Liu
Keyword(s):  
Chemical Composition ◽  
Block Copolymer ◽  
Acrylic Acid ◽  
Self Assembly ◽  
Random Copolymer ◽  
Similar Chemical Composition ◽  
Similar Chemical ◽  
Copolymer Poly ◽  
Poly Acrylic Acid

In this study, a series of random copolymer poly(acrylic acid-co-styrene) (P(AA-co-St)) and block copolymer poly(acrylic acid)-b-polystyrene (PAA-b-PSt) with similar chemical composition but different chain microstructure were synthesized.

The Self-Assembly of an Amphiphilic Block Copolymer: A Dissipative Particle Dynamics Study

2005 ◽  
Vol 42 (3) ◽  
pp. 180-183 ◽  
Author(s):  
S. G. Schulz ◽  
U. Frieske ◽  
H. Kuhn ◽  
G. Schmid ◽  
F. Müller ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Dissipative Particle Dynamics ◽  
Particle Dynamics ◽  
The Self ◽  
Amphiphilic Block Copolymer

scholarly journals Quadruple Hydrogen Bond-Containing A-AB-A Triblock Copolymers: Probing the Influence of Hydrogen Bonding in the Central Block

Molecules ◽  
2021 ◽  
Vol 26 (15) ◽  
pp. 4705
Author(s):  
Boer Liu ◽  
Xi Chen ◽  
Glenn A. Spiering ◽  
Robert B. Moore ◽  
Timothy E. Long
Keyword(s):  
Hydrogen Bonding ◽  
Self Assembly ◽  
Microphase Separation ◽  
Triblock Copolymers ◽  
Random Copolymer ◽  
Thermomechanical Properties ◽  
Structure Property ◽  
Scanning Calorimetry ◽  
Central Block ◽  
Quadruple Hydrogen Bonding

This work reveals the influence of pendant hydrogen bonding strength and distribution on self-assembly and the resulting thermomechanical properties of A-AB-A triblock copolymers. Reversible addition-fragmentation chain transfer polymerization afforded a library of A-AB-A acrylic triblock copolymers, wherein the A unit contained cytosine acrylate (CyA) or post-functionalized ureido cytosine acrylate (UCyA) and the B unit consisted of n-butyl acrylate (nBA). Differential scanning calorimetry revealed two glass transition temperatures, suggesting microphase-separation in the A-AB-A triblock copolymers. Thermomechanical and morphological analysis revealed the effects of hydrogen bonding distribution and strength on the self-assembly and microphase-separated morphology. Dynamic mechanical analysis showed multiple tan delta (δ) transitions that correlated to chain relaxation and hydrogen bonding dissociation, further confirming the microphase-separated structure. In addition, UCyA triblock copolymers possessed an extended modulus plateau versus temperature compared to the CyA analogs due to the stronger association of quadruple hydrogen bonding. CyA triblock copolymers exhibited a cylindrical microphase-separated morphology according to small-angle X-ray scattering. In contrast, UCyA triblock copolymers lacked long-range ordering due to hydrogen bonding induced phase mixing. The incorporation of UCyA into the soft central block resulted in improved tensile strength, extensibility, and toughness compared to the AB random copolymer and A-B-A triblock copolymer comparisons. This study provides insight into the structure-property relationships of A-AB-A supramolecular triblock copolymers that result from tunable association strengths.

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Oxidation and ATP dual-responsive block copolymer containing tertiary sulfoniums: self-assembly, protein complexation and triggered release

2021 ◽  
Author(s):  
Yanfen Jiang ◽  
Shuqi Dong ◽  
Guoyang Qin ◽  
Li Liu ◽  
Hanying Zhao
Keyword(s):  
Block Copolymer ◽  
Self Assembly ◽  
Phenylboronic Acid ◽  
Cationic Polymer ◽  
Release Profile ◽  
Triggered Release ◽  
Dual Responsive ◽  
Protein Complexation

Alkylation of thioether-containing block copolymer simultaneously incorporated sulfoniums and phenylboronic acid moieties. The co-assembly of this cationic polymer and protein generated micelles with an H2O2-and ATP-responsive release profile.

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