Spatially Selective Electroless Deposition of Cobalt on Oxide Surfaces Directed by Microcontact Printing of Dendrimers

Langmuir ◽  
2002 ◽  
Vol 18 (12) ◽  
pp. 4984-4988 ◽  
Author(s):  
X. C. Wu ◽  
A. M. Bittner ◽  
K. Kern
Keyword(s):  
Electroless Deposition ◽  
Microcontact Printing ◽  
Oxide Surfaces

Direct Patterning of NiB on Glass Substrates Using Microcontact Printing and Electroless Deposition

Langmuir ◽  
2003 ◽  
Vol 19 (15) ◽  
pp. 6283-6296 ◽  
Author(s):  
Matthias Geissler ◽  
Hannes Kind ◽  
Patrick Schmidt-Winkel ◽  
Bruno Michel ◽  
Emmanuel Delamarche
Keyword(s):  
Electroless Deposition ◽  
Microcontact Printing ◽  
Glass Substrates ◽  
Direct Patterning

Microcontact Printing of Palladium Colloids:  Micron-Scale Patterning by Electroless Deposition of Copper

Langmuir ◽  
1996 ◽  
Vol 12 (5) ◽  
pp. 1375-1380 ◽  
Author(s):  
Pirmin C. Hidber ◽  
Wolfgang Helbig ◽  
Enoch Kim ◽  
George M. Whitesides
Keyword(s):  
Electroless Deposition ◽  
Microcontact Printing

New Pairs of Inks and Papers for Photolithography, Microcontact Printing, and Scanning Probe Nanolithography

2002 ◽  
Vol 737 ◽  
Author(s):  
Lon A. Porter ◽  
Hee Cheul Choi ◽  
J. M. Schmeltzer ◽  
Alexander E. Ribbe ◽  
Jillian M. Buriak
Keyword(s):  
Photoelectron Spectroscopy ◽  
Precious Metal ◽  
Large Scale ◽  
Electroless Deposition ◽  
Microcontact Printing ◽  
Device Fabrication ◽  
Scanning Probe ◽  
Nanoelectromechanical Systems ◽  
Ambient Conditions ◽  
Metal Thin Films

ABSTRACTCurrently, there is considerable interest in producing patterned metallic structures with reduced dimensions for use in technologies such as ultra large scale integration (ULSI) device fabrication, nanoelectromechanical systems (NEMS), and arrayed nanosensors, without sacrificing throughput or cost effectiveness. Research in our laboratory has focused on the preparation of precious metal thin films on semiconductor substrates via electroless deposition. This method provides for the facile interfacing of metal nanoparticles with a group (IV) and III-IV compound semiconductor surfaces. Morphologically complex films composed of gold, platinum, and palladium nanoparticles have been prepared as a result of the immersion of germanium and gallium arsenide substrates into dilute, aqueous solutions of tetrachloraurate (III), tetrachloroplatinate (II), and tetrachloropalladate (II), respectively. Continuous metallic films form spontaneously under ambient conditions, in the absence of a fluoride source or an externally applied current. This facile electroless deposition methodology provides an alternative to complex and expensive vacuum methods of metallization, yet allows for the preparation of both thin and thick nanostructured films with control over surface morphology and deposition rate. Furthermore, precious metal films prepared in this way exhibit excellent adhesion to the underlying semiconductor substrate. The resultant films were characterized utilizing scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and scanning probe microscopy (SPM). In order to apply this novel metallization method toward the development of useful technologies, patterning utilizing photolithography, microcontact printing (μCP), and scanning probe nanolithography (SPN) has been demonstrated.

Patterned Electroless Deposition of Copper by Microcontact Printing Palladium(II) Complexes on Titanium-Covered Surfaces

Langmuir ◽  
2000 ◽  
Vol 16 (16) ◽  
pp. 6367-6373 ◽  
Author(s):  
Hannes Kind ◽  
Matthias Geissler ◽  
Heinz Schmid ◽  
Bruno Michel ◽  
Klaus Kern ◽  
...  
Keyword(s):  
Electroless Deposition ◽  
Microcontact Printing

Nanoscale Surface Patterning

2003 ◽  
Vol 776 ◽  
Author(s):  
Meng Yu ◽  
Albena Ivanisevic
Keyword(s):  
Atomic Force Microscope ◽  
Silicon Oxide ◽  
Microcontact Printing ◽  
Surface Patterning ◽  
Oxide Surfaces ◽  
Atomic Force ◽  
Diallyldimethylammonium Chloride ◽  
Surface Patterns ◽  
And Control ◽  
Polymer Packing

AbstractWe present a methodology based on Dip-Pen Nanolithography 1 to fabricate nanoscale surface patterns composed of polyelectrolytes. Two widely used polymers Poly(diallyldimethylammonium chloride) (PDDA) and Poly(sodium 4-styrenesulfonate) PSS were chosen as the DPN “inks”. Patterns were created and evaluated on silicon oxide surfaces using an Atomic Force Microscope (AFM). To compare the polymer packing and the height of the nanopatterns, additional fabrication was performed using microcontact printing. We were able to generate structures with better polymer packing using DPN and control the height of the polymer structures more reproducibly compared to microcontact printing.

Hybrid TiO2/metal nanoparticle microstructures made by microcontact printing, absorption and electroless deposition

2017 ◽  
Vol 5 (24) ◽  
pp. 5882-5886 ◽  
Author(s):  
Sebastian Lamping ◽  
Bart Jan Ravoo
Keyword(s):  
Electroless Deposition ◽  
Microcontact Printing ◽  
Metal Nanoparticle ◽  
Top Down ◽  
Bottom Up

TiO2/metal hybrid microstructures are obtained by a combination of “top-down” (printing) and “bottom-up” (absorption) assembly.

Electroless Deposition of Cu on Glass and Patterning with Microcontact Printing

Langmuir ◽  
2003 ◽  
Vol 19 (17) ◽  
pp. 6567-6569 ◽  
Author(s):  
Emmanuel Delamarche ◽  
James Vichiconti ◽  
Shawn A. Hall ◽  
Matthias Geissler ◽  
William Graham ◽  
...  
Keyword(s):  
Electroless Deposition ◽  
Microcontact Printing
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