A kinetic study of the chemical vapor deposition of iron films using iron pentacarbonyl

Langmuir ◽  
1991 ◽  
Vol 7 (6) ◽  
pp. 1188-1191 ◽  
Author(s):  
Francisco. Zaera
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Iron Pentacarbonyl ◽  
Iron Films

ChemInform Abstract: Kinetic Study on Chemical Vapor Deposition of Titanium Disulfide Thin Film.

ChemInform ◽  
1989 ◽  
Vol 20 (37) ◽  
Author(s):  
K. KANEHORI ◽  
F. KIRINO ◽  
Y. ITO ◽  
K. MIYAUCHI ◽  
T. KUDO
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Titanium Disulfide

Kinetic Study on Chemical Vapor Deposition of Titanium Disulfide Thin Film

1989 ◽  
Vol 136 (5) ◽  
pp. 1265-1270 ◽  
Author(s):  
Keiichi Kanehori ◽  
Fumiyoshi Kirino ◽  
Yukio Ito ◽  
Katsuki Miyauchi ◽  
Tetsuichi Kudo
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Titanium Disulfide

Kinetic Study of the Chemical Vapor Deposition of Tantalum in Long Narrow Channels

2016 ◽  
Vol 3 (14) ◽  
pp. 1500795 ◽  
Author(s):  
James Atwoki Mugabi ◽  
Søren Eriksen ◽  
Irina Petrushina ◽  
Erik Christensen ◽  
Niels J. Bjerrum
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Narrow Channels

Laboratory batch reactor method for kinetic study of chemical vapor deposition

AIChE Journal ◽  
1996 ◽  
Vol 42 (4) ◽  
pp. 1108-1115
Author(s):  
Carol M. McConica ◽  
David A. Bell ◽  
Kevin L. Baker ◽  
Devin Moss
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Batch Reactor ◽  
Chemical Vapor

Roles of Gas Phase and Surface Photolysis in Laser Chemical Vapor Deposition from Fe(CO)5

1989 ◽  
Vol 158 ◽  
Author(s):  
Xin Xu ◽  
J.I. Steinfeld
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Photolysis ◽  
Chemical State ◽  
Xps Analysis ◽  
Laser Chemical Vapor Deposition ◽  
Iron Films

ABSTRACTThe chemical state of the carbon and oxygen incorporated in iron films formed by laser photolysis of Fe(CO)5 has been examined by profiling XPS analysis. A significant portion of the codeposited CO is photodissociated at the growing surface.

Microstructure and orientation of iron crystals by thermal chemical vapor deposition with imposition of magnetic field

2002 ◽  
Vol 17 (11) ◽  
pp. 2865-2874 ◽  
Author(s):  
Noboru Yoshikawa ◽  
Takanori Endo ◽  
Shoji Taniguchi ◽  
Satoshi Awaji ◽  
Kazuo Watanabe ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Boundary Migration ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Preferred Orientation ◽  
Grain Structure ◽  
Iron Films ◽  
The Magnetic Field

Iron crystals were deposited by thermally activated chemical vapor deposition with imposition of magnetic field. In this study, the deposition was conducted by imposing a magnetic field up to 3.5 T in a temperature range between 0.48 and 0.51 of TmFe (melting point of iron), which is below the Curie point of iron (0.58 TmFe). The microstructures and crystal orientations of the deposits were investigated. In the deposition process, island-shaped crystals were formed on a scale of several microns; then a film was grown by their coalescence. As the magnetic field magnitude increased, population of the island-shaped crystals having a cubic shape increased. Simultaneously, their ω-scanned (200) profile became sharper. Their degree of (100) preferred orientation was dependent on the magnetic field up to 3.5 T, which is usually high enough for the saturated magnetization of iron crystals. However, when the substrate was placed parallel to the magnetic field, (100) preferred orientation was not observed for the island-shaped crystals. A large and bimodal ω-scanned (110) profile having sharp peaks was obtained when the substrate was inclined 45° to the field. Preferred (100) orientation was not obtained from the iron films, for which two reasons were pointed out. The first is the secondary grown crystals on the island-shaped crystals having different orientations, and the second is the observed zone III grain structure of the films, where grain boundary migration occurred.

Kinetic study of chemical vapor deposition of WSix films from WF6 and SiH2Cl2: Determination of molecular size and reactivity of gas species

2006 ◽  
Vol 513 (1-2) ◽  
pp. 36-42 ◽  
Author(s):  
Takeyasu Saito ◽  
Yukihiro Shimogaki ◽  
Yasuyuki Egashira ◽  
Katsuro Sugawara ◽  
Katsumi Takahiro ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Kinetic Study ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Molecular Size
Sign in / Sign up

Export Citation Format

Share Document